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1. CN102046836 - Sintered Cu-Ga sputtering target and method for producing the target

Office China
Application Number 201080001562.8
Application Date 29.06.2010
Publication Number 102046836
Publication Date 04.05.2011
Grant Number 102046836
Grant Date 03.10.2012
Publication Kind B
IPC
C23C 14/34
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
B22F 1/00
BPERFORMING OPERATIONS; TRANSPORTING
22CASTING; POWDER METALLURGY
FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
1Special treatment of metallic powder, e.g. to facilitate working, to improve properties; Metallic powders per se, e.g. mixtures of particles of different composition
B22F 3/14
BPERFORMING OPERATIONS; TRANSPORTING
22CASTING; POWDER METALLURGY
FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
3Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor
12Both compacting and sintering
14simultaneously
B22F 9/04
BPERFORMING OPERATIONS; TRANSPORTING
22CASTING; POWDER METALLURGY
FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
9Making metallic powder or suspensions thereof; Apparatus or devices specially adapted therefor
02using physical processes
04starting from solid material, e.g. by crushing, grinding or milling
B22F 9/08
BPERFORMING OPERATIONS; TRANSPORTING
22CASTING; POWDER METALLURGY
FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
9Making metallic powder or suspensions thereof; Apparatus or devices specially adapted therefor
02using physical processes
06starting from liquid material
08by casting, e.g. through sieves or in water, by atomising or spraying
C22C 1/04
CCHEMISTRY; METALLURGY
22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
CALLOYS
1Making non-ferrous alloys
04by powder metallurgy
CPC
C22C 9/00
CCHEMISTRY; METALLURGY
22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
CALLOYS
9Alloys based on copper
B22F 3/14
BPERFORMING OPERATIONS; TRANSPORTING
22CASTING; POWDER METALLURGY
FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER
3Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; ; Presses and furnaces
12Both compacting and sintering
14simultaneously
B22F 2998/00
BPERFORMING OPERATIONS; TRANSPORTING
22CASTING; POWDER METALLURGY
FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER
2998Supplementary information concerning processes or compositions relating to powder metallurgy
C22C 1/0425
CCHEMISTRY; METALLURGY
22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
CALLOYS
1Making alloys
04by powder metallurgy
0425Copper-based alloys
C22C 28/00
CCHEMISTRY; METALLURGY
22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
CALLOYS
28Alloys based on a metal not provided for in groups C22C5/00 - C22C27/00
C22C 30/02
CCHEMISTRY; METALLURGY
22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
CALLOYS
30Alloys containing less than 50% by weight of each constituent
02containing copper
Applicants JX Nippon Mining & Metals Corp.
JX日矿日石金属株式会社
Inventors Ikisawa Masakatsu
生泽正克
Takami Hideo
高见英生
Tamura Tomoya
田村友哉
Agents jin longhe fan weimin
中原信达知识产权代理有限责任公司 11219
中原信达知识产权代理有限责任公司 11219
Priority Data 2009-174253 27.07.2009 JP
Title
(EN) Sintered Cu-Ga sputtering target and method for producing the target
(ZH) Cu-Ga烧结体溅射靶及该靶的制造方法
Abstract
(EN)
Disclosed is a sintered Cu-Ga alloy sputtering target which is characterized by being composed of a sintered body of a Cu-Ga alloy powder that has a Ga concentration of 20-60 at% with the balance made up of Cu and unavoidable impurities. The sintered Cu-Ga alloy sputtering target is also characterized in that the sintered body has a relative density of not less than 97%, an average crystal grain size of 5-30 [mu]m and a flexural strength of not less than 150 MPa. The Cu-Ga target is free from compositional segregation, and has low brittleness and a high Ga concentration of 25-45 at%. Also disclosed is a method for producing the Cu-Ga target. Since the sintered Cu-Ga alloy sputtering target improves the yields of target production and CIGS solar cell production and thus can reduce the production cost of a CIGS solar cell, the sintered Cu-Ga alloy sputtering target is useful as a material for CIGS solar cell production by a selenization method.

(ZH)

一种Cu-Ga合金烧结体溅射靶,其特征在于,由Ga浓度为20~60原子%、余量为Cu和不可避免的杂质的Cu-Ga合金粉末烧结体制成,该烧结体的相对密度为97%以上,平均结晶粒径为5~30μm,并且抗折力为150MPa以上。可提供没有组成偏析、脆性小的Ga浓度为25~45原子%的高Ga浓度的Cu-Ga靶及其制造方法,由于能够提高制造靶和制造CIGS系太阳能电池的成品率并降低制造成本,因此作为通过硒化法制造的CIGS系太阳能电池的制造用材料是有用的。