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1. WO2022161736 - MULTI-CHANNEL LIGHT SOURCE FOR PROJECTION OPTICS HEATING

Publication Number WO/2022/161736
Publication Date 04.08.2022
International Application No. PCT/EP2021/087888
International Filing Date 30.12.2021
IPC
G03F 7/20 2006.1
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G03F 7/70891
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
70858Environment aspects, e.g. pressure of beam-path gas, temperature
70883of optical system
70891Temperature
Applicants
  • ASML NETHERLANDS B.V. [NL]/[NL]
  • ASML HOLDING N.V. [NL]/[NL]
Inventors
  • VAN BOKHOVEN, Laurentius, Johannes, Adrianus
  • AJGAONKAR, Mahesh, Upendra
Agents
  • ASML NETHERLANDS B.V.
Priority Data
63/142,13127.01.2021US
Publication Language English (en)
Filing Language English (EN)
Designated States
Title
(EN) MULTI-CHANNEL LIGHT SOURCE FOR PROJECTION OPTICS HEATING
(FR) SOURCE LUMINEUSE À CANAUX MULTIPLES POUR CHAUFFAGE D'ÉLÉMENTS OPTIQUES DE PROJECTION
Abstract
(EN) Systems, apparatuses, and methods are provided for heating a plurality of optical components. An example method can include receiving an input radiation beam from a radiation source. The example method can further include generating a plurality of output radiation beams based on the input radiation beam. The example method can further include transmitting the plurality of output radiation beams towards a plurality of heater head optics configured to heat the plurality of optical components. Optionally, the example method can further include controlling a respective power value, and realizing a flat-top far-field profile, of each of the plurality of output radiation beams.
(FR) L'invention concerne des systèmes, appareils et procédés de chauffage d'une pluralité de composants optiques. Un exemple de procédé peut consister à recevoir d'une source de rayonnement un faisceau de rayonnement d'entrée. L'exemple de procédé peut en outre consister à générer une pluralité de faisceaux de rayonnement de sortie, selon le faisceau de rayonnement d'entrée. L'exemple de procédé peut en outre consister à transmettre la pluralité de faisceaux de rayonnement de sortie vers une pluralité d'éléments optiques de tête de chauffage, conçus pour chauffer la pluralité de composants optiques. L'exemple de procédé peut en outre éventuellement consister à commander une valeur respective de puissance puis à réaliser un profil de champ lointain à sommets plats de chacun des faisceaux de la pluralité de faisceaux de rayonnement de sortie.
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