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1. WO2022114504 - POWDER SURFACE TREATMENT PLASMA DEVICE USING FLAT FILTER ELECTRODES

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Publication Number WO/2022/114504
Publication Date 02.06.2022
International Application No. PCT/KR2021/013691
International Filing Date 06.10.2021
IPC
B01J 19/08 2006.1
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
19Chemical, physical or physico-chemical processes in general; Their relevant apparatus
08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
B01J 19/10 2006.1
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
19Chemical, physical or physico-chemical processes in general; Their relevant apparatus
08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
10employing sonic or ultrasonic vibrations
H05H 1/46 2006.1
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
1Generating plasma; Handling plasma
24Generating plasma
46using applied electromagnetic fields, e.g. high frequency or microwave energy
CPC
B01J 19/08
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
19Chemical, physical or physico-chemical processes in general; Their relevant apparatus
08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
B01J 19/088
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
19Chemical, physical or physico-chemical processes in general; Their relevant apparatus
08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
087employing electric or magnetic energy
088giving rise to electric discharges
B01J 19/10
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
19Chemical, physical or physico-chemical processes in general; Their relevant apparatus
08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
10employing sonic or ultrasonic vibrations
B01J 2219/00635
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
2219Chemical, physical or physico-chemical processes in general; Their relevant apparatus
00274Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
00583Features relative to the processes being carried out
00603Making arrays on substantially continuous surfaces
00605the compounds being directly bound or immobilised to solid supports
00632Introduction of reactive groups to the surface
00635by reactive plasma treatment
B01J 2219/0894
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
2219Chemical, physical or physico-chemical processes in general; Their relevant apparatus
08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
0894Processes carried out in the presence of a plasma
H05H 1/46
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
HPLASMA TECHNIQUE
1Generating plasma; Handling plasma
24Generating plasma
46using applied electromagnetic fields, e.g. high frequency or microwave energy
Applicants
  • 주식회사 이노플라즈텍 INOPLAZTECH CO., LTD. [KR]/[KR]
  • 울산과학기술원 UNIST(ULSAN NATIONAL INSTITUTE OF SCIENCE AND TECHNOLOGY) [KR]/[KR]
Inventors
  • 이덕연 LEE, Deuk Yeon
  • 이창영 LEE, Chang Young
  • 정만기 JUNG, Man Ki
  • 이수민 LEE, Soo Min
  • 김경환 KIM, Kyeong Hwan
  • 김상진 KIM, Sang Jin
  • 곽재원 GWAK, Jae Won
Agents
  • 전용준 JEON, Yong Joon
Priority Data
10-2020-016003825.11.2020KR
Publication Language Korean (ko)
Filing Language Korean (KO)
Designated States
Title
(EN) POWDER SURFACE TREATMENT PLASMA DEVICE USING FLAT FILTER ELECTRODES
(FR) DISPOSITIF À PLASMA DE TRAITEMENT DE SURFACE DE POUDRE À L'AIDE DES ÉLECTRODES DE FILTRE PLATES
(KO) 평판형 필터 전극을 이용한 분말 표면처리용 플라즈마 장치
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Abstract
(EN) A powder treatment plasma device according to the present invention maximizes processing capacity for performing processing all at once, by stacking a plurality of flat and porous filter electrodes, and thus improves processing efficiency. In addition, since vibration is applied to the filter electrodes by using a vibration generator while causing powder to be adsorbed on surfaces of the filter electrodes by using an adsorption means, the powder can be evenly dispersed on the surfaces of the filter electrodes and mixed, and thus the powder can be evenly surface-treated.
(FR) Un dispositif à plasma de traitement de poudre selon la présente invention maximise la capacité de traitement pour effectuer un traitement tout au moins une fois, par empilement d'une pluralité d'électrodes de filtre plates et poreuses, et améliore ainsi l'efficacité de traitement. De plus, étant donné qu'une vibration est appliquée aux électrodes de filtre à l'aide d'un générateur de vibrations tout en amenant la poudre à être adsorbée sur des surfaces des électrodes de filtre à l'aide d'un moyen d'adsorption, la poudre peut être uniformément dispersée sur les surfaces des électrodes de filtre et mélangée, et ainsi la poudre peut être traitée en surface de façon régulière.
(KO) 본 발명에 따른 분말 처리용 플라즈마 장치는, 평판형이고 다공성 구조의 필터 전극을 복수개 적층 배치함으로써, 한번에 처리할 수 있는 처리 용량을 극대화시킬 수 있으므로 처리 효율이 향상될 수 있다. 또한, 흡착수단을 이용하여 필터 전극의 표면에 분말을 흡착시키면서, 진동 발생기를 이용하여 필터 전극에 진동을 가함으로써, 분말이 필터 전극의 표면에서 고르게 분산되어 섞일 수 있기 때문에, 분말들을 고르게 표면처리할 수 있다.
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