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1. WO2022112979 - LIQUID COMPOSITION SET, POROUS RESIN MANUFACTURING APPARATUS, AND POROUS RESIN MANUFACTURING METHOD

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Publication Number WO/2022/112979
Publication Date 02.06.2022
International Application No. PCT/IB2021/060950
International Filing Date 25.11.2021
IPC
C09D 5/00 2006.1
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
5Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
CPC
C09D 5/00
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
5Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced
Applicants
  • RICOH COMPANY, LTD. [JP]/[JP] (AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BE, BF, BG, BH, BJ, BN, BR, BW, BY, BZ, CA, CF, CG, CH, CI, CL, CM, CN, CO, CR, CU, CY, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, FR, GA, GB, GD, GE, GH, GM, GN, GQ, GR, GT, GW, HN, HR, HU, ID, IE, IL, IN, IR, IS, IT, JO, KE, KG, KH, KM, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MC, MD, ME, MG, MK, ML, MN, MR, MT, MW, MX, MY, MZ, NA, NE, NG, NI, NL, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SI, SK, SL, SM, SN, ST, SV, SY, SZ, TD, TG, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, UZ, VC, VN, WS, ZA, ZM, ZW)
  • OHKIMOTO, Miku [JP]/[JP] (US)
  • TAKAUJI, Keigo [JP]/[JP] (US)
  • NOSE, Daisuke [JP]/[JP] (US)
  • SUGIHARA, Naoki [JP]/[JP] (US)
  • USHIROGOCHI, Toru [JP]/[JP] (US)
Inventors
  • OHKIMOTO, Miku
  • TAKAUJI, Keigo
  • NOSE, Daisuke
  • SUGIHARA, Naoki
  • USHIROGOCHI, Toru
Agents
  • SUZUKI, Yasushi
Priority Data
2020-19790630.11.2020JP
Publication Language English (en)
Filing Language English (EN)
Designated States
Title
(EN) LIQUID COMPOSITION SET, POROUS RESIN MANUFACTURING APPARATUS, AND POROUS RESIN MANUFACTURING METHOD
(FR) ENSEMBLE DE COMPOSITION LIQUIDE, APPAREIL DE FABRICATION DE RÉSINE POREUSE ET PROCÉDÉ DE FABRICATION DE RÉSINE POREUSE
Abstract
(EN) The present disclosure provides a liquid composition set comprising: a liquid composition X comprising a polymerizable compound X and a solvent X; and a liquid composition Y comprising a solvent Y. The liquid composition X is to form a porous resin. A liquid composition Z comprising 10.0% by mass of the liquid composition X and 90.0% by mass of the liquid composition Y has a light transmittance of 30% or more at a wavelength of 550 nm, where the light transmittance is measured while the liquid composition Z is being stirred. A haze measuring element produced from the liquid composition Z has a haze increasing rate of 1.0% or more.
(FR) La présente divulgation concerne un ensemble de composition liquide comprenant : une composition liquide X comprenant un composé polymérisable X et un solvant X ; et une composition liquide Y comprenant un solvant Y. La composition liquide X est destinée à former une résine poreuse. Une composition liquide Z comprenant 10,0 % en masse de la composition liquide X et 90,0 % en masse de la composition liquide Y présente une transmittance de lumière de 30 % ou plus à une longueur d'onde de 550 nm, la transmittance de la lumière étant mesurée pendant que la composition liquide Z subit une agitation. Un élément de mesure de trouble produit à partir de la composition liquide Z a une vitesse d'augmentation de trouble de 1,0 % ou plus.
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