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1. WO2022096171 - HEATING AN OPTICAL ELEMENT OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

Publication Number WO/2022/096171
Publication Date 12.05.2022
International Application No. PCT/EP2021/073240
International Filing Date 23.08.2021
IPC
G03F 7/20 2006.1
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
G02B 7/18 2021.1
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
7Mountings, adjusting means, or light-tight connections, for optical elements
18for prisms; for mirrors
CPC
G02B 5/0891
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
08Mirrors
0891Ultraviolet [UV] mirrors
G02B 7/1815
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
7Mountings, adjusting means, or light-tight connections, for optical elements
18for prisms; for mirrors
181with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
1815with cooling or heating systems
G03F 7/70891
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
70858Environment aspects, e.g. pressure of beam-path gas, temperature
70883of optical system
70891Temperature
Applicants
  • CARL ZEISS SMT GMBH [DE]/[DE] (AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BE, BF, BG, BH, BJ, BN, BR, BW, BY, BZ, CA, CF, CG, CH, CI, CL, CM, CN, CO, CR, CU, CY, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, FR, GA, GB, GD, GE, GH, GM, GN, GQ, GR, GT, GW, HN, HR, HU, ID, IE, IL, IN, IR, IS, IT, JO, JP, KE, KG, KH, KM, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MC, MD, ME, MG, MK, ML, MN, MR, MT, MW, MX, MY, MZ, NA, NE, NG, NI, NL, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SI, SK, SL, SM, SN, ST, SV, SY, SZ, TD, TG, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, UZ, VC, VN, WS, ZA, ZM, ZW)
  • WOLF, Alexander [DE]/[DE] (US)
  • GRUNER, Toralf [DE]/[DE] (US)
Inventors
  • WOLF, Alexander
  • GRUNER, Toralf
Agents
  • FRANK, Hartmut
Priority Data
10 2020 213 983.006.11.2020DE
Publication Language English (en)
Filing Language English (EN)
Designated States
Title
(EN) HEATING AN OPTICAL ELEMENT OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
(FR) CHAUFFAGE D'UN ÉLÉMENT OPTIQUE D'UN APPAREIL D'EXPOSITION PAR PROJECTION MICROLITHOGRAPHIQUE
Abstract
(EN) The invention relates to an optical system, in particular in a microlithographic projection exposure apparatus, and to a method for heating an optical element in an optical system. According to one aspect, an optical system according to the invention comprises an optical element (450) and at least one heating unit (100, 200) for heating said optical element by applying electromagnetic radiation to the optical element, wherein the heating unit comprises as part of an optical collimator (110, 310) and/or as part of a telescope (130, 140, 230, 430), at least one mirror having a non-plane optical effective surface.
(FR) L'invention concerne un système optique, en particulier un appareil d'exposition par projection microlithographique, et un procédé de chauffage d'un élément optique dans un système optique. Selon un aspect, un système optique selon l'invention comprend un élément optique (450) et au moins une unité de chauffage (100, 200) servant à chauffer ledit élément optique en appliquant un rayonnement électromagnétique à l'élément optique, l'unité de chauffage comprenant, en tant que partie d'un collimateur optique (110, 310) et/ou en tant que partie d'un télescope (130, 140, 230, 430), au moins un miroir ayant une surface optique efficace non plane.
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