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1. WO2022076162 - ELECTRON SOURCE WITH MAGNETIC SUPPRESSOR ELECTRODE

Publication Number WO/2022/076162
Publication Date 14.04.2022
International Application No. PCT/US2021/051385
International Filing Date 21.09.2021
IPC
H01J 37/065 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
06Electron sources; Electron guns
065Construction of guns or parts thereof
H01J 37/143 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
10Lenses
14magnetic
143Permanent magnetic lenses
H01J 37/28 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
26Electron or ion microscopes; Electron- or ion-diffraction tubes
28with scanning beams
CPC
H01J 37/063
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
06Electron sources; Electron guns
063Geometrical arrangement of electrodes for beam-forming
H01J 37/09
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
09Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
H01J 37/14
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
10Lenses
14magnetic
H01J 37/3255
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32431Constructional details of the reactor
32532Electrodes
3255Material
Applicants
  • KLA CORPORATION [US]/[US]
Inventors
  • CHUBUN, Nikolai
  • JIANG, Xinrong
  • JIANG, Youfei
  • SEARS, Christopher
Agents
  • MCANDREWS, Kevin
  • MORRIS, Elizabeth M. N.
  • SPURLOCK, Justin Delorean
Priority Data
17/135,27928.12.2020US
63/087,31205.10.2020US
Publication Language English (en)
Filing Language English (EN)
Designated States
Title
(EN) ELECTRON SOURCE WITH MAGNETIC SUPPRESSOR ELECTRODE
(FR) SOURCE D'ÉLECTRONS AVEC ÉLECTRODE DE SUPPRESSION MAGNÉTIQUE
Abstract
(EN) An electron source is disclosed. The electron source may include an electron emitter configured to generate one or more electron beams. The electron source may further include a magnetic suppressor electrode surrounding at least a portion of the electron emitter. The magnetic suppressor electrode may be formed from one or more magnetic materials. The magnetic suppressor may be configured to shield at least a portion of the electron emitter from an axial magnetic field. The electron source may further include an extractor electrode positioned adjacent to a tip of the electron emitter.
(FR) La présente invention concerne une source d'électrons. La source d'électrons peut comprendre un émetteur d'électrons conçu pour générer un ou plusieurs faisceaux d'électrons. La source d'électrons peut également comprendre une électrode de suppression magnétique entourant au moins une partie de l'émetteur d'électrons. L'électrode de suppression magnétique peut être formée à partir d'un ou plusieurs matériaux magnétiques. Le suppresseur magnétique peut être conçu pour protéger, d'un champ magnétique axial, au moins une partie de l'émetteur d'électrons. La source d'électrons peut en outre comprendre une électrode d'extraction positionnée adjacente à une pointe de l'émetteur d'électrons.
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