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1. WO2022048253 - TARGET-MATERIAL INITIAL TREATMENT METHOD FOR PHYSICAL VAPOR DEPOSITION PROCESS, AND CONTROLLER

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Publication Number WO/2022/048253
Publication Date 10.03.2022
International Application No. PCT/CN2021/101632
International Filing Date 22.06.2021
IPC
C23C 14/32 2006.1
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
24Vacuum evaporation
32by explosion; by evaporation and subsequent ionisation of the vapours
CPC
C23C 14/32
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
24Vacuum evaporation
32by explosion; by evaporation and subsequent ionisation of the vapours ; , e.g. ion-plating
C23C 14/54
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
54Controlling or regulating the coating process
C23C 14/56
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
Applicants
  • 长鑫存储技术有限公司 CHANGXIN MEMORY TECHNOLOGIES, INC. [CN]/[CN]
Inventors
  • 李仁龙 LI, Renlong
  • 王农展 WANG, Nung-chan
Agents
  • 北京律智知识产权代理有限公司 BEIJING INTELLEGAL INTELLECTUAL PROPERTY AGENT LTD.
Priority Data
202010921775.804.09.2020CN
Publication Language Chinese (zh)
Filing Language Chinese (ZH)
Designated States
Title
(EN) TARGET-MATERIAL INITIAL TREATMENT METHOD FOR PHYSICAL VAPOR DEPOSITION PROCESS, AND CONTROLLER
(FR) PROCÉDÉ DE TRAITEMENT INITIAL DE MATÉRIAU CIBLE POUR PROCÉDÉ DE DÉPÔT PHYSIQUE EN PHASE VAPEUR, ET DISPOSITIF DE COMMANDE
(ZH) 用于物理气相沉积工艺的靶材初始处理方法与控制器
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Abstract
(EN) A target-material initial treatment method based on a physical vapor deposition process, and a controller. The target-material initial treatment method comprises: increasing a conducted current on a new target material (11) multiple times starting from zero, until the conducted current reaches a preset current. The provided target-material initial treatment method can prevent downtime overhaul caused by a new target material (11) producing an electric arc when same participates in a cavity cleaning process.
(FR) L'invention concerne un procédé de traitement initial de matériau cible basé sur un procédé de dépôt physique en phase vapeur, et un dispositif de commande. Le procédé de traitement initial de matériau cible consiste : à augmenter un courant conduit sur un nouveau matériau cible (11) de multiples fois à partir de zéro, jusqu'à ce que le courant conduit atteigne un courant prédéfini. Le procédé de traitement initial de matériau cible selon l'invention permet d'empêcher des arrêts excessifs provoqués par un nouveau matériau cible (11) produisant un arc électrique lorsqu'il participe à une opération de nettoyage de cavité.
(ZH) 基于物理气相沉积工艺的靶材初始处理方法与控制器。靶材初始处理方法包括：从零开始分多次提高新靶材（11）上的导通电流至预设电流。提供的靶材初始处理方法可以避免新靶材（11）参与腔体清洁过程中出现电弧（12）而引起宕机检修。
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