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1. WO2022044570 - DEVELOPER MANAGEMENT METHOD, PLATEMAKING METHOD, DEVELOPER MANAGEMENT DEVICE, AND PLATEMAKING DEVICE

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Publication Number WO/2022/044570
Publication Date 03.03.2022
International Application No. PCT/JP2021/026000
International Filing Date 09.07.2021
IPC
G03F 7/00 2006.1
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F 7/30 2006.1
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26Processing photosensitive materials; Apparatus therefor
30Imagewise removal using liquid means
CPC
G03F 7/00
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F 7/30
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26Processing photosensitive materials; Apparatus therefor
30Imagewise removal using liquid means
Applicants
  • 富士フイルム株式会社 FUJIFILM CORPORATION [JP]/[JP]
Inventors
  • 白川　征人 SHIRAKAWA Masato
Agents
  • 伊東　秀明 ITOH Hideaki
  • 三橋　史生 MITSUHASHI Fumio
Priority Data
2020-14458628.08.2020JP
Publication Language Japanese (ja)
Filing Language Japanese (JA)
Designated States
Title
(EN) DEVELOPER MANAGEMENT METHOD, PLATEMAKING METHOD, DEVELOPER MANAGEMENT DEVICE, AND PLATEMAKING DEVICE
(FR) PROCÉDÉ DE GESTION DE RÉVÉLATEUR, PROCÉDÉ DE FABRICATION DE PLAQUE, DISPOSITIF DE GESTION DE RÉVÉLATEUR ET DISPOSITIF DE FABRICATION DE PLAQUE
(JA) 現像液の管理方法、製版方法、現像液の管理装置、および製版装置
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Abstract
(EN) The present invention provides a developer management method, a developer management device, a platemaking method, and a platemaking device with which appropriate development can be implemented by suppressing adhesion of a development residue, and the exchange frequency of a developer is reduced. This platemaking method comprises: a development step for developing a flexographic printing plate original plate subjected to imagewise exposure by removing an unexposed portion thereof using a developer; a step for measuring the electric conductivity of the developer used for removing the unexposed portion of the flexographic printing plate original plate subjected to imagewise exposure; and a replenishment step for, on the basis of the electric conductivity measured in the measurement step, replenishing the developer with at least one liquid out of a development replenisher and water such that electric conductivity in a set range is achieved.
(FR) La présente invention concerne un procédé de gestion de révélateur, un dispositif de gestion de révélateur, un procédé de fabrication de plaque et un dispositif de fabrication de plaque qui permettent de mettre en œuvre un développement approprié en supprimant l'adhérence d'un résidu de développement et qui réduisent la fréquence de remplacement d'un révélateur. Ce procédé de fabrication de plaque comprend : une étape de développement consistant à développer une plaque originale de plaque d'impression flexographique soumise à une exposition par image en retirant une partie non exposée de celle-ci à l'aide d'un révélateur ; une étape consistant à mesurer la conductivité électrique du révélateur utilisé pour éliminer la partie non exposée de la plaque originale de plaque d'impression flexographique soumise à une exposition par image ; et une étape de réapprovisionnement consistant, sur la base de la conductivité électrique mesurée dans l'étape de mesure, à réapprovisionner le révélateur avec au moins un liquide entre un régénérateur de développement et/ou de l'eau de façon à obtenir une conductivité électrique se trouvant dans une plage définie.
(JA) 現像カスの付着を抑制し、適正な現像を実施でき、かつ現像液の交換頻度を少なくする現像液の管理方法、および現像液の管理装置、製版方法、および製版装置を提供する。製版方法は、現像液を用いて画像様露光後のフレキソ印刷版原版の未露光部を除去して現像する現像工程と、画像様露光後のフレキソ印刷版原版の未露光部の除去に用いた現像液の電導度を測定する工程と、測定工程により測定された電導度に基づいて、定められた範囲の電導度となるように現像補充液および水のうち、少なくとも１つの液体を現像液に補充する補充工程とを有する。
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