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1. WO2022010599 - PROCESS KIT WITH PROTECTIVE CERAMIC COATINGS FOR HYDROGEN AND NH3 PLASMA APPLICATION

Publication Number WO/2022/010599
Publication Date 13.01.2022
International Application No. PCT/US2021/035639
International Filing Date 03.06.2021
IPC
H01J 37/32 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes
H01L 21/683 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
683for supporting or gripping
CPC
B08B 7/0035
BPERFORMING OPERATIONS; TRANSPORTING
08CLEANING
BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
7Cleaning by methods not provided for in a single other subclass or a single group in this subclass
0035by radiant energy, e.g. UV, laser, light beam or the like
H01J 2237/334
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
32Processing objects by plasma generation
33characterised by the type of processing
334Etching
H01J 2237/335
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
32Processing objects by plasma generation
33characterised by the type of processing
335Cleaning
H01J 37/3244
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32431Constructional details of the reactor
3244Gas supply means
H01J 37/32495
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32431Constructional details of the reactor
32458Vessel
32477characterised by the means for protecting vessels or internal parts, e.g. coatings
32495Means for protecting the vessel against plasma
H01J 37/32513
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32431Constructional details of the reactor
32458Vessel
32513Sealing means, e.g. sealing between different parts of the vessel
Applicants
  • APPLIED MATERIALS, INC. [US]/[US]
Inventors
  • WU, Jian
  • HAWRYLCHAK, Lara
  • DUAN, Ren-Guan
  • HWANG, Bernard L.
  • BEVAN, Malcolm J.
  • LIU, Wei
Agents
  • DOUGHERTY, Chad M.
  • HAMMACK, Marcus W.
Priority Data
16/926,10410.07.2020US
Publication Language English (en)
Filing Language English (EN)
Designated States
Title
(EN) PROCESS KIT WITH PROTECTIVE CERAMIC COATINGS FOR HYDROGEN AND NH3 PLASMA APPLICATION
(FR) KIT DE TRAITEMENT AVEC REVÊTEMENTS CÉRAMIQUES PROTECTEURS POUR APPLICATION DE PLASMA D'HYDROGÈNE ET DE NH3
Abstract
(EN) A method and apparatus for the use of hydrogen plasma treatments is described herein. The process chamber includes a plurality of chamber components. The plurality of chamber components may be coated with a yttrium zirconium oxide composition, such as a Y2O3-ZrO2 solid solution. Some of the plurality of chamber components are replaced with a bulk yttrium zirconium oxide ceramic. Yet other chamber components are replaced with similar components of different materials.
(FR) La présente invention concerne un procédé et un appareil permettant l'utilisation de traitements de plasma d'hydrogène. La chambre de traitement comprend une pluralité de composants de chambre. La pluralité de composants de chambre peuvent être revêtus d'une composition d'oxyde de zirconium et d'yttrium, telle qu'une solution solide de Y2O3-ZrO2 . Certains composants de la pluralité de composants de chambre sont remplacés par une céramique d'oxyde de zirconium et d'yttrium massif. D'autres composants de chambre sont remplacés par des composants similaires de différents matériaux.
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