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1. WO2022010214 - GROWTH INHIBITOR FOR FORMING PELLICLE PROTECTIVE THIN FILM, METHOD FOR FORMING PELLICLE PROTECTIVE THIN FILM BY USING SAME, AND MASK MANUFACTURED THEREFROM

Publication Number WO/2022/010214
Publication Date 13.01.2022
International Application No. PCT/KR2021/008539
International Filing Date 06.07.2021
IPC
C23C 16/455 2006.1
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44characterised by the method of coating
455characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
G03F 1/62 2012.1
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
62Pellicles or pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
Applicants
  • 솔브레인 주식회사 SOULBRAIN CO., LTD. [KR]/[KR]
Inventors
  • 연창봉 YEON, Chang Bong
  • 정재선 JUNG, Jae Sun
  • 도승철 DO, Seung Chul
  • 왕호림 WANG, Ho Lim
Agents
  • 특허법인 뉴코리아 NEWKOREA PATENT & LAW FIRM
Priority Data
10-2020-008423008.07.2020KR
Publication Language Korean (ko)
Filing Language Korean (KO)
Designated States
Title
(EN) GROWTH INHIBITOR FOR FORMING PELLICLE PROTECTIVE THIN FILM, METHOD FOR FORMING PELLICLE PROTECTIVE THIN FILM BY USING SAME, AND MASK MANUFACTURED THEREFROM
(FR) INHIBITEUR DE CROISSANCE POUR FORMER UNE COUCHE MINCE DE PROTECTION DE PELLICULE, PROCÉDÉ DE FORMATION D'UNE COUCHE MINCE DE PROTECTION DE PELLICULE À L'AIDE DE CELUI-CI, ET MASQUE FABRIQUÉ À PARTIR DE CELUI-CI
(KO) 펠리클 보호 박막 형성용 성장 억제제, 이를 이용한 펠리클 보호 박막 형성 방법 및 이로부터 제조된 마스크
Abstract
(EN) The present invention relates to a growth inhibitor for forming a pellicle protective thin film, a method for forming a pellicle protective thin film by using same, and a mask manufactured therefrom and, more specifically, to a growth inhibitor for forming a pellicle protective thin film, a method for forming a pellicle protective thin film by using same, and a mask manufactured therefrom, the growth inhibitor being a compound represented by chemical formula 1 of AnBmXoYiZj (A is carbon or silicon, B is hydrogen or a C1-3 alkyl, X is at least one of fluorine (F), chlorine (Cl), bromine (Br) and iodine (I), Y and Z are independently at least one selected from the group consisting of oxygen, nitrogen, sulfur and fluorine and are not the same as each other, n is an integer of 1-15, o is an integer of 1 or more, m is 0-2n+1, and i and j are each an integer of 0-3.). According to the present invention, provided are a growth inhibitor for forming a pellicle protective thin film, a method for forming a pellicle protective thin film by using same, and a mask manufactured therefrom, the growth inhibitor preventing, without lowering the transmittance of a pellicle, corrosion or deterioration, and thus can significantly improve the lifespan of a mask employing same.
(FR) La présente invention concerne un inhibiteur de croissance pour former une couche mince de protection de pellicule, un procédé de formation d'une couche mince de protection de pellicule à l'aide de celui-ci, et un masque fabriqué à partir de celui-ci et, plus spécifiquement, un inhibiteur de croissance pour former une couche mince de protection de pellicule, un procédé de formation d'une couche mince de protection de pellicule à l'aide de celui-ci, et un masque fabriqué à partir de celui-ci, l'inhibiteur de croissance étant un composé représenté par la formule chimique 1 de AnBmXoYiZj (A correspond au carbone ou au silicium, B correspond à l'hydrogène ou à un alkyle en C1-3, X correspond à au moins un atome de fluor (F), de chlore (Cl), de brome (Br) et d'iode (I), Y et Z correspondent indépendamment à au moins un élément choisi dans le groupe constitué par l'oxygène, l'azote, le soufre et le fluor et ne sont pas les mêmes, n est un nombre entier entre 1 et 15, o est un nombre entier de 1 ou plus, m est 0-2n+1, et i et j sont chacun un nombre entier entre 0 et 3.). La présente invention concerne un inhibiteur de croissance pour former une couche mince de protection de pellicule, un procédé de formation d'une couche mince de protection de pellicule à l'aide de celui-ci, et un masque fabriqué à partir de celui-ci, l'inhibiteur de croissance empêchant, sans diminuer la transmittance d'une pellicule, la corrosion ou la détérioration, et pouvant ainsi améliorer significativement la durée de vie d'un masque l'utilisant.
(KO) 본 발명은 펠리클 보호 박막 형성용 성장 억제제, 이를 이용한 펠리클 보호 박막 형성 방법 및 이로부터 제조된 마스크에 관한 것으로, 보다 상세하게는 하기 화학식 1 [화학식 1] AnBmXoYiZj (상기 A는 탄소 또는 규소이고, 상기 B는 수소 또는 탄소수 1 내지 3의 알킬이며, 상기 X는 불소(F), 염소(Cl), 브롬(Br) 및 아이오딘(I) 중 1종 이상이고, 상기 Y와 Z은 독립적으로 산소, 질소, 황 및 플루오린으로 이루어진 군으로부터 선택된 1종 이상이며 서로 같지 않고, 상기 n은 1 내지 15의 정수이며, 상기 o는 1 이상의 정수이고, m은 0 내지 2n+1이며, 상기 i와 j는 0 내지 3의 정수이다.)로 표시되는 화합물인 펠리클 보호 박막 형성용 성장 억제제, 이를 이용한 펠리클 보호 박막 형성 방법 및 이로부터 제조된 마스크에 관한 것이다. 본 발명에 따르면, 펠리클의 투과도를 저하시키지 않으면서도 부식이나 열화를 방지하여 이를 채용한 마스크의 수명을 크게 개선시킬 수 있는 펠리클 보호 박막 형성용 성장 억제제, 이를 이용한 펠리클 보호 박막 형성 방법 및 이로부터 제조된 마스크를 제공하는 효과가 있다. [대표도] 도 10
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