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1. WO2022009197 - SYSTEMS AND METHODS FOR OPTICAL METROLOGY

Publication Number WO/2022/009197
Publication Date 13.01.2022
International Application No. PCT/IL2021/050824
International Filing Date 05.07.2021
IPC
G01N 21/65 2006.1
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
63optically excited
65Raman scattering
G01N 21/55 2014.1
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
17Systems in which incident light is modified in accordance with the properties of the material investigated
55Specular reflectivity
G01J 3/44 2006.1
GPHYSICS
01MEASURING; TESTING
JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
3Spectrometry; Spectrophotometry; Monochromators; Measuring colours
28Investigating the spectrum
44Raman spectrometry; Scattering spectrometry
Applicants
  • NOVA LTD [IL]/[IL]
Inventors
  • OREN, Yonatan
  • HOLLANDER, Eyal
  • SCHLEIFER, Elad
  • BARAK, Gilad
Agents
  • SHALEM, Meirav
Priority Data
63/048,13705.07.2020US
Publication Language English (en)
Filing Language English (EN)
Designated States
Title
(EN) SYSTEMS AND METHODS FOR OPTICAL METROLOGY
(FR) SYSTÈMES ET PROCÉDÉS DE MÉTROLOGIE OPTIQUE
Abstract
(EN) Systems and methods for metrology of workpieces such as wafers, using spectrometry of multi- spot- arrays formed over a test area of the tester workpiece, for optically measuring characteristics of the tested workpiece, where the optical metrology system is configured such that the distribution of energy density or flux of the multi-spot-array over the test area of the tested workpiece is such that prevents affecting the workpiece during its testing.
(FR) L'invention concerne des systèmes et des procédés de métrologie de pièces à travailler telles que des tranches, à l'aide d'une spectrométrie de réseaux à points multiples formés sur une zone de test de la pièce à travailler de test, permettant une mesure optique de caractéristiques de la pièce à travailler testée, le système de métrologie optique étant conçu de sorte que la distribution de la densité ou du flux d'énergie du réseau à points multiples sur la zone de test de la pièce à travailler testée soit telle qu'elle empêche d'affecter la pièce à travailler pendant son test.
Latest bibliographic data on file with the International Bureau