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1. WO2022008462 - A DETECTOR SUBSTRATE FOR USE IN A CHARGED PARTICLE MULTI-BEAM ASSESSMENT TOOL

Publication Number WO/2022/008462
Publication Date 13.01.2022
International Application No. PCT/EP2021/068548
International Filing Date 05.07.2021
IPC
H01L 27/144 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
27Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
14including semiconductor components sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
144Devices controlled by radiation
H01L 27/146 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
27Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
14including semiconductor components sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
144Devices controlled by radiation
146Imager structures
H01L 31/115 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
31Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
08in which radiation controls flow of current through the device, e.g. photoresistors
10characterised by at least one potential-jump barrier or surface barrier, e.g. phototransistors
115Devices sensitive to very short wavelength, e.g. X-rays, gamma-rays or corpuscular radiation
H01J 37/12 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
10Lenses
12electrostatic
H01J 37/153 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
153Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
H01J 37/244 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
244Detectors; Associated components or circuits therefor
Applicants
  • ASML NETHERLANDS B.V. [NL]/[NL]
Inventors
  • WIELAND, Marco, Jan-Jaco
  • NIHTIANOV, Stoyan
  • VEENSTRA, Roy, Ramon
  • JIANG, Hui
Agents
  • ASML NETHERLANDS B.V.
Priority Data
20184160.806.07.2020EP
20217152.623.12.2020EP
Publication Language English (en)
Filing Language English (EN)
Designated States
Title
(EN) A DETECTOR SUBSTRATE FOR USE IN A CHARGED PARTICLE MULTI-BEAM ASSESSMENT TOOL
(FR) SUBSTRAT DE DÉTECTEUR UTILISABLE DANS UN OUTIL D’ESTIMATION MULTIFAISCEAU DE PARTICULES CHARGÉES
Abstract
(EN) There is provided a detector substrate (or detector array) for use in a charged particle multi-beam assessment tool to detect charged particles from a sample. The detector substrate defines an array of apertures for the beam paths of respective charged particle beams of a multi-beam. The detector substrate comprises: a sensor unit array. A sensor unit of the sensor unit array is adjacent a corresponding aperture of the aperture array. The sensor unit is configured to capture charged particles from the sample. The detector array comprises an amplification circuit associated with each sensor unit in the sensor unit array and proximate to the corresponding aperture in the aperture array. The amplification circuit comprising a Trans Impedance Amplifier and/or an analogue to digital converter.
(FR) L’invention concerne un substrat de détecteur (ou un réseau de détecteurs) utilisable dans un outil d’estimation multifaisceau de particules chargées pour détecter des particules chargées à partir d’un échantillon. Le substrat de détecteur définit un réseau d’orifices pour les chemins de faisceaux de faisceaux respectifs de particules chargées d’un multifaisceau. Le substrat de détecteur comprend : un réseau d’unités de capteurs. Une unité de capteur du réseau d’unités de capteurs est adjacente à un orifice correspondant du réseau d’orifices. L’unité de capteur sert à capturer des particules chargées à partir de l’échantillon. Le réseau de détecteurs comprend un circuit d’amplification associé à chaque unité de capteur dans le réseau d’unités de capteurs et proche de l’orifice correspondant dans le réseau d’orifices. Le circuit d’amplification comprend un amplificateur de trans-impédance et/ou un convertisseur analogique-numérique.
Latest bibliographic data on file with the International Bureau