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1. WO2022008336 - OPTICAL ELEMENT, OPTICAL SYSTEM, LITHOGRAPHY SYSTEM, AND METHOD FOR OPERATING AN OPTICAL ELEMENT

Publication Number WO/2022/008336
Publication Date 13.01.2022
International Application No. PCT/EP2021/068161
International Filing Date 01.07.2021
IPC
G03F 7/20 2006.1
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
G02B 5/08 2006.1
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
08Mirrors
Applicants
  • CARL ZEISS SMT GMBH [DE]/[DE]
Inventors
  • KIMLING, Johannes
  • GRAF, Peter
  • WABRA, Norbert
  • SCHNEIDER, Sonja
  • FINKEN, Reimar
Agents
  • HORN KLEIMANN WAITZHOFER PATENTANWÄLTE PARTG MBB
Priority Data
10 2020 208 415.706.07.2020DE
Publication Language German (de)
Filing Language German (DE)
Designated States
Title
(DE) OPTISCHES ELEMENT, OPTISCHES SYSTEM, LITHOGRAPHIEANLAGE UND VERFAHREN ZUM BETREIBEN EINES OPTISCHEN ELEMENTS
(EN) OPTICAL ELEMENT, OPTICAL SYSTEM, LITHOGRAPHY SYSTEM, AND METHOD FOR OPERATING AN OPTICAL ELEMENT
(FR) ÉLÉMENT OPTIQUE, SYSTÈME OPTIQUE, INSTALLATION DE LITHOGRAPHIE ET PROCÉDÉ DE FONCTIONNEMENT D'UN ÉLÉMENT OPTIQUE
Abstract
(DE) Ein optisches Element (200, 210, 220, 230, 240) für eine Lithographieanlage (100A, 100B), umfassend: eine optische Oberfläche (201, 211, 221, 231, 241), und einen Fotowiderstand (202, 212, 222, 232, 242) mit einem elektrischen Fotowiderstandswert (RFoto), welcher in Abhängigkeit einer Lichtmenge, die auf einen Bereich (203, 213, 223, 243) der optischen Oberfläche (201, 211, 221, 231, 241) einfällt, variiert.
(EN) The invention relates to an optical element (200, 210, 220, 230, 240) for a lithography system (100A, 100B), comprising: an optical surface (201, 211, 221, 231, 241) and a photoresistor (202, 212, 222, 232, 242) having an electric photoresistor value (RPhoto) that varies according to an amount of light incident on a region (203, 213, 223, 243) of the optical surface (201, 211, 221, 231, 241).
(FR) L’invention concerne un élément optique (200, 210, 220, 230, 240) pour une installation de lithographie (100A, 100B), comprenant : une surface optique (201, 211, 221, 231, 241) et une photo-résistance (202, 212, 222, 232, 242) ayant une valeur de photo-résistance électrique (RFoto) qui varie en fonction d'une quantité de lumière incidente sur une zone (203, 213, 223, 243) de la surface optique (201, 211, 221, 231, 241).
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