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1. WO2022008173 - WATER-GUIDING SYSTEM AND LITHOGRAPHY APPARATUS

Publication Number WO/2022/008173
Publication Date 13.01.2022
International Application No. PCT/EP2021/065941
International Filing Date 14.06.2021
IPC
G03F 7/20 2006.1
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
F28F 9/02 2006.1
FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
28HEAT EXCHANGE IN GENERAL
FDETAILS OF HEAT-EXCHANGE OR HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
9Casings; Header boxes; Auxiliary supports for elements; Auxiliary members within casings
02Header boxes; End plates
CPC
F16L 23/22
FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
LPIPES; JOINTS OR FITTINGS FOR PIPES; SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING; MEANS FOR THERMAL INSULATION IN GENERAL
23Flanged joints
16characterised by the sealing means
18the sealing means being rings
22made exclusively of a material other than metal
G03F 7/70891
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
70858Environment aspects, e.g. pressure of beam-path gas, temperature
70883of optical system
70891Temperature
Applicants
  • CARL ZEISS SMT GMBH [DE]/[DE]
Inventors
  • BIEHLER, Jasmin
  • MUELLER, Christoph
Agents
  • HORN KLEIMANN WAITZHOFER PATENTANWÄLTE PARTG MBB
Priority Data
10 2020 208 496.307.07.2020DE
Publication Language German (de)
Filing Language German (DE)
Designated States
Title
(DE) WASSERFÜHRENDES SYSTEM UND LITHOGRAPHIEANLAGE
(EN) WATER-GUIDING SYSTEM AND LITHOGRAPHY APPARATUS
(FR) SYSTÈME DE GUIDAGE D'EAU ET APPAREIL LITHOGRAPHIQUE
Abstract
(DE) Ein wasserführendes System (200), insbesondere ein Kühlsystem, für eine Lithographieanlage (100A, 100B), aufweisend einen Kühler (202), welcher eine Flanschfläche (210) umfasst, eine Leitung (212) zum Zuführen von Kühlwasser (206) zu dem Kühler (202) oder zum Abführen von Kühlwasser (206) von dem Kühler (202), wobei die Leitung (212) einen Flanschabschnitt (216) aufweist, welcher an der Flanschfläche (210) anliegt, und eine Dichtungsvorrichtung (300), welche einen scheibenförmigen axialen Verpressabschnitt (304) und einen scheibenförmigen radialen Verpressabschnitt (312) umfasst, wobei der axiale Verpressabschnitt (304) derart axial zwischen der Flanschfläche (210) und dem Flanschabschnitt (216) verpresst ist, dass der axiale Verpressabschnitt (304) jeweils flächig an der Flanschfläche (210) und an dem Flanschabschnitt (216) anliegt, wobei der Flanschabschnitt (216) eine erste Ringnut (220) umfasst, in welcher die Dichtungsvorrichtung (300) aufgenommen ist, und wobei die Dichtungsvorrichtung (300) mit Hilfe des radialen Verpressabschnitts (312) radial in der ersten Ringnut (220) verpresst ist.
(EN) The invention relates to a water-guiding system (200), in particular a cooling system, for lithography apparatus (100A, 100B), comprising a cooler (202) having a flange surface (210), a line (212) for supplying cooling water (206) to the cooler (202) or for discharging cooling water (206) from the cooler (202), wherein the line (212) has a flange section (216) that is in contact with the flange surface (210), and a sealing device (300) having a disc-shaped axial pressing section (304) and a disc-shaped radial pressing section (312), wherein the axial pressing section (304) is pressed axially between the flange surface (210) and the flange section (216) in such a way that the axial pressing section (304) is in planar contact with the flange surface (210) and the flange section (216), wherein the flange section (216) has a first ring groove (220) in which the sealing device (300) is accommodated, and wherein the sealing device (300) is pressed radially in the first ring groove (220) using the radial pressing section (312).
(FR) L'invention concerne un système de guidage d'eau (200), en particulier un système de refroidissement, pour un appareil de lithographie (100A, 100B), comprenant un refroidisseur (202) ayant une surface de bride (210), une conduite (212) servant à fournir de l'eau de refroidissement (206) au refroidisseur (202) ou à évacuer l'eau de refroidissement (206) du refroidisseur (202), la conduite (212) comportant une section de bride (216) qui est en contact avec la surface de bride (210), et un dispositif d'étanchéité (300) ayant une section de pression axiale en forme de disque (304) et une section de pression radiale en forme de disque (312), la section de pression axiale (304) étant axialement pressée entre la surface de bride (210) et la section de bride (216) de telle sorte que la section de pression axiale (304) est en contact plan avec la surface de bride (210) et avec la section de bride (216), la section de bride (216) comportant une première rainure annulaire (220) dans laquelle le dispositif d'étanchéité (300) est logé, et le dispositif d'étanchéité (300) étant radialement pressé dans la première rainure annulaire (220) à l'aide de la section de pression radiale (312).
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