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1. WO2022007946 - NON-IMMERSIVE DRY SINTERING STRATEGY FOR REALIZING DECENT METAL BASED ELECTRODES

Publication Number WO/2022/007946
Publication Date 13.01.2022
International Application No. PCT/CN2021/105466
International Filing Date 09.07.2021
IPC
H05K 3/12 2006.1
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
3Apparatus or processes for manufacturing printed circuits
10in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
12using printing techniques to apply the conductive material
H01L 31/0224 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
31Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
02Details
0224Electrodes
H01L 31/18 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
31Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
Applicants
  • THE UNIVERSITY OF HONG KONG [CN]/[CN]
Inventors
  • CHOY, Chik Ho
  • HE, Xinjun
Agents
  • LIU, SHEN & ASSOCIATES
Priority Data
63/049,65509.07.2020US
Publication Language English (en)
Filing Language English (EN)
Designated States
Title
(EN) NON-IMMERSIVE DRY SINTERING STRATEGY FOR REALIZING DECENT METAL BASED ELECTRODES
(FR) STRATÉGIE DE FRITTAGE À SEC NON IMMERSIVE POUR FABRIQUER DES ÉLECTRODES BASÉES SUR UN MÉTAL DÉCENT
Abstract
(EN) The method of sintering metal nanoparticles and method of making conductive metal films are disclosed. The method comprises: depositing a layer of metal nanoparticles, wherein the metal nanoparticles are isolated in the layer; depositing a dry sintering layer; sintering the layer of metal nanoparticles to form a sintered metal film; and optionally drying the sintered metal film. The method has easy progress, and the film has excellent quality.
(FR) Le procédé de frittage de nanoparticules métalliques et le procédé de fabrication de films métalliques conducteurs sont divulgués. Le procédé consiste : à déposer une couche de nanoparticules métalliques, les nanoparticules métalliques étant isolées dans la couche ; à déposer une couche de frittage à sec ; à fritter la couche de nanoparticules métalliques pour former un film métallique fritté ; et éventuellement à sécher le film métallique fritté. Le déroulement du procédé est facile, et le film a une excellente qualité.
Latest bibliographic data on file with the International Bureau