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1. WO2022006189 - TARGET AND ALGORITHM TO MEASURE OVERLAY BY MODELING BACK SCATTERING ELECTRONS ON OVERLAPPING STRUCTURES

Publication Number WO/2022/006189
Publication Date 06.01.2022
International Application No. PCT/US2021/039735
International Filing Date 30.06.2021
IPC
G03F 7/20 2006.1
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
Applicants
  • KLA CORPORATION [US]/[US]
Inventors
  • GUTMAN, Nadav
  • ACHE, Oliver
  • PHELPS, Carey
Agents
  • MCANDREWS, Kevin
  • MORRIS, Elizabeth M. N.
  • SPURLOCK, Justin Delorean
Priority Data
16/918,24201.07.2020US
Publication Language English (en)
Filing Language English (EN)
Designated States
Title
(EN) TARGET AND ALGORITHM TO MEASURE OVERLAY BY MODELING BACK SCATTERING ELECTRONS ON OVERLAPPING STRUCTURES
(FR) CIBLE ET ALGORITHME SERVANT À MESURER UNE SUPERPOSITION PAR LA MODÉLISATION D'ÉLECTRONS DE RÉTRODIFFUSION SUR DES STRUCTURES SE CHEVAUCHANT
Abstract
(EN) An overlay target includes a grating-over-grating structure with a bottom grating structure disposed on a specimen and a top grating structure disposed on the bottom grating structure. The overlay target further includes a calibration scan location including the bottom grating structure but not the top grating structure and an overlay scan location including the top grating structure and the bottom grating structure.
(FR) Une cible de superposition comprend une structure de réseau-sur-réseau ayant une structure de réseau inférieure disposée sur un échantillon et une structure de réseau supérieure disposée sur la structure de réseau inférieure. La cible de superposition comprend en outre un emplacement de balayage d'étalonnage comprenant la structure de réseau inférieure mais pas la structure de réseau supérieure et un emplacement de balayage de superposition comprenant la structure de réseau supérieure et la structure de réseau inférieure.
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