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1. WO2022005150 - PLASMA GENERATION DEVICE AND CONTROL METHOD THEREFOR

Publication Number WO/2022/005150
Publication Date 06.01.2022
International Application No. PCT/KR2021/008137
International Filing Date 29.06.2021
IPC
H01J 37/32 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes
Applicants
  • 인투코어테크놀로지 주식회사 EN2CORE TECHNOLOGY INC. [KR]/[KR]
Inventors
  • 엄세훈 UHM, Sae Hoon
  • 이윤성 LEE, Yun Seong
  • 손영훈 SOHN, Yeong Hoon
  • 박세홍 PARK, Se Hong
Agents
  • 특허법인 아이피에스 IPS PATENT FIRM
Priority Data
10-2020-008059630.06.2020KR
Publication Language Korean (ko)
Filing Language Korean (KO)
Designated States
Title
(EN) PLASMA GENERATION DEVICE AND CONTROL METHOD THEREFOR
(FR) DISPOSITIF DE GÉNÉRATION DE PLASMA ET SON PROCÉDÉ DE COMMANDE
(KO) 플라즈마 생성 장치 및 그 제어 방법
Abstract
(EN) According to one embodiment of the present specification, provided is a plasma generation device comprising: a chamber providing a generation space for plasma; an antenna module, which is arranged to be adjacent to the chamber, is connected to a first power source, and forms an induced electric field in the chamber; an electrode, which is arranged to be adjacent to the chamber, is connected to a second power source, and assists in the generation of the plasma; a sensor for acquiring sensing information related to the state of the plasma; and a controller for controlling the first power source and the second power source.
(FR) Selon un mode de réalisation, la présente invention concerne un dispositif de génération de plasma comprenant : une chambre fournissant un espace de génération pour un plasma ; un module d'antenne, qui est placé adjacent à la chambre, est connecté à une première source d'alimentation, et forme un champ électrique induit dans la chambre ; une électrode, qui est placée adjacente à la chambre, est connectée à une seconde source d'alimentation, et aide à la génération du plasma ; un capteur servant à acquérir des informations de détection relatives à l'état du plasma ; et un dispositif de commande pour commander la première source d'alimentation et la seconde source d'alimentation.
(KO) 본 명세서의 일 실시예에 따르면, 플라즈마 생성 장치에 있어서 상기 플라즈마의 생성 공간을 제공하는 챔버, 상기 챔버 주변에 배치되고, 제1 전원과 연결되고 상기 챔버 내에 유도 전기장을 형성하는 안테나 모듈, 상기 챔버 주변에 배치되고, 제2 전원과 연결되고 상기 플라즈마 생성을 보조하는 전극, 상기 플라즈마의 상태와 관련된 센싱 정보를 획득하는 센서; 및 상기 제1 전원 및 상기 제2 전원을 제어하는 컨트롤러를 포함하는 플라즈마 생성 장치가 제공될 수 있다.
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