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1. WO2022005025 - SUBSTRATE PROCESSING SYSTEM WITH VERTICAL ARRANGEMENT STRUCTURE

Publication Number WO/2022/005025
Publication Date 06.01.2022
International Application No. PCT/KR2021/006652
International Filing Date 28.05.2021
IPC
H01L 21/67 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
H01L 21/677 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
677for conveying, e.g. between different work stations
H01L 21/66 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
66Testing or measuring during manufacture or treatment
Applicants
  • 주식회사 케이씨텍 KCTECH CO., LTD. [KR]/[KR]
Inventors
  • 이동화 LEE, Dong Hwa
  • 김형철 KIM, Hyung Chul
  • 정유선 JUNG, You Sun
Agents
  • 특허법인 무한 MUHANN PATENT & LAW FIRM
Priority Data
10-2020-008011030.06.2020KR
Publication Language Korean (ko)
Filing Language Korean (KO)
Designated States
Title
(EN) SUBSTRATE PROCESSING SYSTEM WITH VERTICAL ARRANGEMENT STRUCTURE
(FR) SYSTÈME DE TRAITEMENT DE SUBSTRAT À STRUCTURE D'AGENCEMENT VERTICAL
(KO) 수직 배열 구조를 갖는 기판 처리 시스템
Abstract
(EN) A substrate processing system, according to one embodiment, comprises: a cleaning device, positioned at a first position, for performing a cleaning process for a substrate; a drying device, positioned at a second position, for performing a drying process for the substrate; and a transfer unit for transferring the substrate from the cleaning device to the drying device, wherein the first position and the second position may be vertically arranged.
(FR) Un système de traitement de substrat, selon un mode de réalisation, comprend : un dispositif de nettoyage, positionné dans une première position, permettant d'effectuer un processus de nettoyage pour un substrat ; un dispositif de séchage, positionné dans une seconde position, permettant d'effectuer un processus de séchage du substrat ; et une unité de transfert permettant de transférer le substrat du dispositif de nettoyage au dispositif de séchage, la première position et la seconde position pouvant être disposées verticalement.
(KO) 일 실시 예에 따른 기판 처리 시스템은, 기판에 대한 세정 공정을 수행하고, 제1 위치에 위치하는 세정 장치; 상기 기판에 대한 건조 공정을 수행하고, 제2 위치에 위치하는 건조 장치; 및 상기 세정 장치로부터 상기 건조 장치로 상기 기판을 이송하는 이송부를 포함하고, 상기 제1 위치 및 제2 위치는 수직으로 배열될 수 있다.
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