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1. WO2022004450 - MANAGEMENT DEVICE, LITHOGRAPHY DEVICE, MANAGEMENT METHOD, AND METHOD FOR MANUFACTURING ARTICLE

Publication Number WO/2022/004450
Publication Date 06.01.2022
International Application No. PCT/JP2021/023323
International Filing Date 21.06.2021
IPC
G03F 7/20 2006.1
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
H01L 21/68 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
68for positioning, orientation or alignment
G05B 13/02 2006.1
GPHYSICS
05CONTROLLING; REGULATING
BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
13Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
02electric
CPC
G03F 7/20
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
G05B 13/02
GPHYSICS
05CONTROLLING; REGULATING
BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
13Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
02electric
H01L 21/68
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
68for positioning, orientation or alignment
Applicants
  • キヤノン株式会社 CANON KABUSHIKI KAISHA [JP]/[JP]
Inventors
  • 伊藤 覚 ITO Satoru
Agents
  • 特許業務法人大塚国際特許事務所 OHTSUKA PATENT OFFICE, P.C.
Priority Data
2020-11191029.06.2020JP
Publication Language Japanese (ja)
Filing Language Japanese (JA)
Designated States
Title
(EN) MANAGEMENT DEVICE, LITHOGRAPHY DEVICE, MANAGEMENT METHOD, AND METHOD FOR MANUFACTURING ARTICLE
(FR) DISPOSITIF DE GESTION, DISPOSITIF DE LITHOGRAPHIE, PROCÉDÉ DE GESTION, ET PROCÉDÉ DE FABRICATION D'ARTICLE
(JA) 管理装置、リソグラフィー装置、管理方法および物品製造方法
Abstract
(EN) This management device is provided with a learning unit that, when a reward obtained from a control result of an object to be controlled by a control unit for controlling the object to be controlled using a neural network in which a parameter value is determined by reinforcement learning does not satisfy a predetermined criterion, redetermines the parameter value by reinforcement learning.
(FR) La présente invention concerne un dispositif de gestion qui est pourvu d'une unité d'apprentissage qui, lorsqu'une récompense obtenue à partir d'un résultat de commande d'un objet devant être commandé par une unité de commande servant à commander l'objet à commander à l'aide d'un réseau neuronal dans lequel une valeur de paramètre est déterminée par apprentissage par renforcement ne satisfait pas un critère prédéterminé, redétermine la valeur de paramètre par apprentissage par renforcement.
(JA) 管理装置は、強化学習によってパラメータ値が決定されるニューラルネットワークを使って制御対象を制御する制御部による前記制御対象の制御結果から求められる報酬が所定基準を満たさない場合に、強化学習によって前記パラメータ値を再決定する学習部を備える。
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