WO2022002570 HEATING SYSTEM AND METHOD FOR HEATING LARGE-SURFACE SUBSTRATES

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Publication Number WO/2022/002570

Publication Date 06.01.2022

International Application No. PCT/EP2021/065955

International Filing Date 14.06.2021

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Priority Data

10 2020 208 184.0

30.06.2020

Publication Language German (de)

Filing Language German (DE)

Designated States

Title

(DE) HEIZSYSTEM UND VERFAHREN ZUM AUFHEIZEN VON GROSSFLÄCHIGEN SUBSTRATEN

(EN) HEATING SYSTEM AND METHOD FOR HEATING LARGE-SURFACE SUBSTRATES

(FR) SYSTÈME DE CHAUFFAGE ET PROCÉDÉ DE CHAUFFAGE DE SUBSTRATS DE GRANDE SURFACE

Abstract

(DE) Die vorliegende Erfindung betrifft ein Heizsystem sowie ein Verfahren zum Aufheizen von großflächigen Substraten.

(EN) The present invention relates to a heating system and to a method for heating large-surface substrates.

(FR) La présente invention concerne un système de chauffage et un procédé de chauffage de substrats de grande surface.

H	ELECTRICITY
01	BASIC ELECTRIC ELEMENTS
L	SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
31	Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
18	Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof

H	ELECTRICITY
01	BASIC ELECTRIC ELEMENTS
L	SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21	Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67	Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components

H	ELECTRICITY
01	BASIC ELECTRIC ELEMENTS
L	SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21	Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67	Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
683	for supporting or gripping
687	using mechanical means, e.g. chucks, clamps or pinches

H	ELECTRICITY
01	BASIC ELECTRIC ELEMENTS
L	SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
31	Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
18	Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof

H	ELECTRICITY
01	BASIC ELECTRIC ELEMENTS
L	SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21	Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67	Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components