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1. WO2022002497 - A SIGNAL PARAMETER DETERMINATION METHOD, A HETERODYNE INTERFEROMETER SYSTEM, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD

Publication Number WO/2022/002497
Publication Date 06.01.2022
International Application No. PCT/EP2021/064239
International Filing Date 27.05.2021
IPC
G01B 9/02 2006.1
GPHYSICS
01MEASURING; TESTING
BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
9Instruments as specified in the subgroups and characterised by the use of optical measuring means
02Interferometers
G03F 7/20 2006.1
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
G03F 9/00 2006.1
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
9Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Applicants
  • ASML NETHERLANDS B.V. [NL]/[NL]
Inventors
  • JANSEN, Maarten, Jozef
  • IKKINK, Teunis, Jan
Agents
  • ASML NETHERLANDS B.V.
Priority Data
20182778.929.06.2020EP
Publication Language English (en)
Filing Language English (EN)
Designated States
Title
(EN) A SIGNAL PARAMETER DETERMINATION METHOD, A HETERODYNE INTERFEROMETER SYSTEM, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
(FR) PROCÉDÉ DE DÉTERMINATION DE PARAMÈTRES DE SIGNAUX, SYSTÈME INTERFÉROMÉTRIQUE À HÉTÉRODYNE, APPAREIL LITHOGRAPHIQUE ET PROCÉDÉ DE FABRICATION DE DISPOSITIFS
Abstract
(EN) The invention provides a a method to determine one or more signal parameters of each signal of interest in a plurality of signals of interest received at a single detector of a heterodyne interferometer, said method comprising the following steps: a. for each signal or interest, calculating a cleaned-up signal by estimating signal contributions of the other signals of interest and subtracting these estimated signal contributions from the plurality of signals of interest; and b. for each signal of interest, determining one or more signal parameters from the respective cleaned-up signal.
(FR) L'invention concerne un procédé de détermination d'un ou de plusieurs paramètres de signaux de chaque signal d'intérêt d'une pluralité de signaux d'intérêt reçus au niveau d'un seul détecteur d'un interféromètre à hétérodyne, ledit procédé comprenant les étapes suivantes : a) pour chaque signal d'intérêt, calculer un signal nettoyé par estimation des contributions de signaux des autres signaux d'intérêt et soustraire ces contributions estimées de signaux de la pluralité de signaux d'intérêt ; et b) pour chaque signal d'intérêt, déterminer un ou plusieurs paramètres de signal à partir du signal nettoyé respectif.
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