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1. WO2022000747 - METHOD FOR PREPARING ARRAY SUBSTRATE, AND ARRAY SUBSTRATE AND DISPLAY PANEL

Publication Number WO/2022/000747
Publication Date 06.01.2022
International Application No. PCT/CN2020/112083
International Filing Date 28.08.2020
IPC
H01L 21/77 2017.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
70Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in or on a common substrate or of specific parts thereof; Manufacture of integrated circuit devices or of specific parts thereof
77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
H01L 27/12 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
27Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
02including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
12the substrate being other than a semiconductor body, e.g. an insulating body
H01L 27/32 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
27Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
28including components using organic materials as the active part, or using a combination of organic materials with other materials as the active part
32with components specially adapted for light emission, e.g. flat-panel displays using organic light-emitting diodes
Applicants
  • 武汉华星光电技术有限公司 WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD. [CN]/[CN]
Inventors
  • 吴咏波 WU, Yongbo
Agents
  • 深圳紫藤知识产权代理有限公司 PURPLEVINE INTELLECTUAL PROPERTY (SHENZHEN) CO., LTD.
Priority Data
202010597543.128.06.2020CN
Publication Language Chinese (zh)
Filing Language Chinese (ZH)
Designated States
Title
(EN) METHOD FOR PREPARING ARRAY SUBSTRATE, AND ARRAY SUBSTRATE AND DISPLAY PANEL
(FR) PROCÉDÉ DE PRÉPARATION D'UN SUBSTRAT DE RÉSEAU, SUBSTRAT DE RÉSEAU ET PANNEAU D'AFFICHAGE
(ZH) 阵列基板制备方法、阵列基板以及显示面板
Abstract
(EN) A method for preparing an array substrate. The method comprises: forming a light-shielding layer pattern by using an active layer mask, and then forming an active layer pattern by using the active layer mask, wherein an orthographic projection of the light-shielding layer pattern on a base substrate covers an orthographic projection of the active layer pattern on the base substrate. A light-shielding layer and an active layer are formed by using the same active layer mask, such that a light-shielding layer mask is saved, thereby solving the technical problem of it being relatively costly to form a light-shielding layer for an existing array substrate.
(FR) Procédé de préparation d'un substrat de réseau. Le procédé consiste à : former un motif de couche de protection contre la lumière en utilisant un masque de couche active, puis former un motif de couche active en utilisant le masque de couche active, une projection orthographique du motif de couche de protection contre la lumière sur un substrat de base recouvrant une projection orthographique du motif de couche active sur le substrat de base. Une couche de protection contre la lumière et une couche active sont formées en utilisant le même masque de couche active, de telle sorte qu'un masque de couche de protection contre la lumière est économisé, ce qui permet de résoudre le problème technique lié au coût relativement élevé de formation d'une couche de protection contre la lumière pour un substrat de réseau existant.
(ZH) 阵列基板的制备方法包括采用有源层光罩形成遮光层图案,再利用有源层光罩形成有源层图案,遮光层图案在衬底基板上正投影覆盖有源层图案在衬底基板上的正投影。通过遮光层和有源层共用一有源层光罩形成,节省了一道遮光层光罩,解决了现有阵列基板存在形成遮光层的成本较高的技术问题。
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