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1. WO2021065865 - VANADIUM SILICARBIDE FILM, VANADIUM SILICARBIDE FILM-COATED MEMBER, AND METHOD FOR PRODUCING VANADIUM SILICARBIDE FILM-COATED MEMBER

Publication Number WO/2021/065865
Publication Date 08.04.2021
International Application No. PCT/JP2020/036806
International Filing Date 29.09.2020
IPC
C23C 16/30 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
22characterised by the deposition of inorganic material, other than metallic material
30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
C01B 33/00 2006.01
CCHEMISTRY; METALLURGY
01INORGANIC CHEMISTRY
BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF
33Silicon; Compounds thereof
C23C 16/50 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44characterised by the method of coating
50using electric discharges
Applicants
  • DOWAサーモテック株式会社 DOWA THERMOTECH CO., LTD. [JP]/[JP]
Inventors
  • 羽深 智 HABUKA, Satoru
  • 松岡 宏之 MATSUOKA, Hiroyuki
Agents
  • 萩原 康司 HAGIWARA, Yasushi
  • 金本 哲男 KANEMOTO, Tetsuo
  • 扇田 尚紀 OGITA, Naoki
  • 齊藤 隆史 SAITO, Takashi
Priority Data
2019-18008630.09.2019JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) VANADIUM SILICARBIDE FILM, VANADIUM SILICARBIDE FILM-COATED MEMBER, AND METHOD FOR PRODUCING VANADIUM SILICARBIDE FILM-COATED MEMBER
(FR) FILM DE SILICARBURE DE VANADIUM, ÉLÉMENT REVÊTU D'UN FILM DE SILICARBURE DE VANADIUM, ET PROCÉDÉ DE PRODUCTION D'UN ÉLÉMENT REVÊTU D'UN FILM DE SILICARBURE DE VANADIUM
(JA) 珪炭化バナジウム膜、珪炭化バナジウム膜被覆部材および珪炭化バナジウム膜被覆部材の製造方法
Abstract
(EN)
Provided is a vanadium silicarbide film comprising vanadium, silicon, and carbon, and the total of the vanadium element concentration, the silicon element concentration, and the carbon element concentration in the film is at least 90 at%.
(FR)
L'invention concerne un film de silicarbure de vanadium comprenant du vanadium, du silicium et du carbone, et le total de la concentration d'élément de vanadium, de la concentration d'élément de silicium et de la concentration d'élément de carbone dans le film étant d'au moins 90 % at.
(JA)
バナジウムと、珪素と、炭素とを含有し、膜中のバナジウム元素濃度と、珪素元素濃度と、炭素元素濃度の合計が90at%以上である、珪炭化バナジウム膜。
Also published as
Latest bibliographic data on file with the International Bureau