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1. WO2021046301 - COMMON ELECTROSTATIC CHUCK FOR DIFFERING SUBSTRATES

Publication Number WO/2021/046301
Publication Date 11.03.2021
International Application No. PCT/US2020/049332
International Filing Date 04.09.2020
IPC
H01L 21/683 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
683for supporting or gripping
H02N 13/00 2006.01
HELECTRICITY
02GENERATION, CONVERSION, OR DISTRIBUTION OF ELECTRIC POWER
NELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
13Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
CPC
H01J 37/32697
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32431Constructional details of the reactor
32697Electrostatic control
H01L 21/6833
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
683for supporting or gripping
6831using electrostatic chucks
6833Details of electrostatic chucks
Applicants
  • APPLIED MATERIALS, INC. [US]/[US]
Inventors
  • RAMACHANDRAN, Vinodh
  • JUPUDI, Ananthkrishna
  • BABU, Sarath
Agents
  • WRIGHT, Jonathan B.
Priority Data
62/896,71206.09.2019US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) COMMON ELECTROSTATIC CHUCK FOR DIFFERING SUBSTRATES
(FR) MANDRIN ÉLECTROSTATIQUE COMMUN POUR SUBSTRATS DIFFÉRENTS
Abstract
(EN)
An apparatus, methods and controllers for electrostatically chucking varied substrate materials are disclosed. Some embodiments of the disclosure provide electrostatic chucks with variable polarity and/or voltage. Some embodiments of the disclosure provide electrostatic chucks able to operate as monopolar and bipolar electrostatic chucks. Some embodiments of the disclosure provide bipolar electrostatic chucks able to compensate for substrate bias and produce approximately equal chucking force at different electrodes.
(FR)
L'invention concerne un appareil, des procédés et des dispositifs de commande pour le serrage électrostatique de matériaux de substrat variés. Certains modes de réalisation de l'invention concernent des mandrins électrostatiques à polarité et/ou tension variables. Certains modes de réalisation de l'invention concernent des mandrins électrostatiques aptes à fonctionner en tant que mandrins électrostatiques et bipolaires monopolaires. Certains modes de réalisation de l'invention concernent des mandrins électrostatiques bipolaires pouvant compenser une polarisation de substrat et produire une force de serrage approximativement égale au niveau d'électrodes différentes.
Also published as
Latest bibliographic data on file with the International Bureau