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1. WO2021029922 - THREE-PHASE PULSING SYSTEMS AND METHODS FOR PLASMA PROCESSING

Publication Number WO/2021/029922
Publication Date 18.02.2021
International Application No. PCT/US2020/030194
International Filing Date 28.04.2020
IPC
H01J 37/32 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes
CPC
H01J 2237/332
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
32Processing objects by plasma generation
33characterised by the type of processing
332Coating
H01J 2237/3341
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
32Processing objects by plasma generation
33characterised by the type of processing
334Etching
3341Reactive etching
H01J 37/321
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
32082Radio frequency generated discharge
321the radio frequency energy being inductively coupled to the plasma
H01J 37/32146
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
32082Radio frequency generated discharge
32137controlling of the discharge by modulation of energy
32146Amplitude modulation, includes pulsing
Applicants
  • TOKYO ELECTRON LIMITED [JP]/[JP]
  • TOKYO ELECTRON U.S. HOLDINGS, INC. [US]/[US] (JP)
Inventors
  • VENTZEK, Peter
  • RANJAN, Alok
  • OHATA, Mitsunori
Agents
  • STRANG, Eric
Priority Data
16/540,16014.08.2019US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) THREE-PHASE PULSING SYSTEMS AND METHODS FOR PLASMA PROCESSING
(FR) SYSTÈMES ET PROCÉDÉS DE GÉNÉRATION D'IMPULSIONS EN TROIS PHASES POUR TRAITEMENT AU PLASMA
Abstract
(EN)
A method of plasma processing includes performing a reactive species control phase, performing an ion/radical control phase, and performing a by-product control phase. The reactive species control phase includes pulsing source power to a processing chamber to generate ions and radicals in a plasma. The ion/radical control phase is performed after the reactive species control phase. The ion/radical control phase includes reducing the source power to the processing chamber and pulsing bias power to a substrate in the processing chamber. The by-product control phase is performed after the ion/radical control phase. The by-product control phase includes reducing the source power to the processing chamber relative to the reactive species control phase and reducing the bias power to the substrate relative to the ion/radical control phase.
(FR)
Le procédé de traitement au plasma selon l'invention consiste à : mettre en oeuvre une phase de commande d'espèces réactives, mettre en oeuvre une phase de commande d'ions/radicaux et mettre en oeuvre une phase de commande de sous-produits. La phase de commande d'espèces réactives consiste à appliquer une impulsion d'énergie de source à une chambre de traitement afin de générer des ions et des radicaux dans un plasma. La phase de commande d'ions/radicaux est mise en oeuvre après la phase de commande d'espèces réactives. La phase de commande d'ions/radicaux consiste à réduire l'énergie de source appliquée à la chambre de traitement et à appliquer une impulsion d'énergie de polarisation à un substrat se situant dans la chambre de traitement. La phase de commande de sous-produits est mise en oeuvre après la phase de commande d'ions/radicaux. La phase de commande de sous-produits consiste à réduire l'énergie de source appliquée à la chambre de traitement par rapport à la phase de commande d'espèces réactives, et à réduire l'énergie de polarisation appliquée au substrat par rapport à la phase de commande d'ions/radicaux.
Also published as
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