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1. WO2021001092 - SURFACE TREATMENT APPARATUS AND METHOD FOR SURFACE TREATMENT OF PATTERNING DEVICES AND OTHER SUBSTRATES

Publication Number WO/2021/001092
Publication Date 07.01.2021
International Application No. PCT/EP2020/064806
International Filing Date 28.05.2020
IPC
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
H01L 21/67 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
G03F 1/82 2012.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
68Preparation processes not covered by groups G03F1/20-G03F1/5096
82Auxiliary processes, e.g. cleaning
Applicants
  • ASML NETHERLANDS B.V. [NL]/[NL]
Inventors
  • VAN DE KERKHOF, Marcus, Adrianus
  • BALTUSSEN, Sander
  • BROMAN, Pär, Mårten, Lukas
  • KEMPEN, Antonius, Theodorus, Wilhelmus
  • MOORS, Johannes, Hubertus, Josephina
Agents
  • SLENDERS, Petrus
Priority Data
19183607.101.07.2019EP
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) SURFACE TREATMENT APPARATUS AND METHOD FOR SURFACE TREATMENT OF PATTERNING DEVICES AND OTHER SUBSTRATES
(FR) APPAREIL DE TRAITEMENT DE SURFACE ET PROCÉDÉ POUR LE TRAITEMENT DE SURFACE DE DISPOSITIFS DE FORMATION DE MOTIFS ET D'AUTRES SUBSTRATS
Abstract
(EN)
Disclosed is a surface treatment apparatus and method for surface treatment of substrates such as wafers or substrates. The surface treatment apparatus comprises one or more support structures for supporting one or more substrates and one or more ultraviolet illumination sources configured to emit ultraviolet illumination, and being operable to treat said at least one surface of said one or more substrates while said one or more substrates being supported by said one or more support structures. The one or more ultraviolet illumination sources are distinct from an exposure source and not operable to emit exposure illumination for exposing a pattern on a wafer.
(FR)
L'invention concerne un appareil de traitement de surface et un procédé pour le traitement de surface de substrats tels que des tranches ou des substrats. L'appareil de traitement de surface comprend une ou plusieurs structures de support pour porter un ou plusieurs substrats et une ou plusieurs sources d'éclairage par ultraviolets configurées pour émettre un éclairage ultraviolet, et étant utilisable pour traiter ladite au moins une surface desdits un ou plusieurs substrats alors que lesdits un ou plusieurs substrats sont portés par lesdites une ou plusieurs structures de support. Lesdites une ou plusieurs sources d'éclairage par ultraviolets sont distinctes d'une source d'exposition et ne sont pas utilisables pour émettre un éclairage d'exposition pour exposer un motif sur une tranche.
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