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1. WO2020223734 - ATOMIC-TO-NANOSCALE MATTER EMISSION/FLOW REGULATION DEVICES AND METHODS

Publication Number WO/2020/223734
Publication Date 05.11.2020
International Application No. PCT/US2020/031373
International Filing Date 04.05.2020
IPC
B41J 2/06 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
2Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
005characterised by bringing liquid or particles selectively into contact with a printing material
01Ink jet
015characterised by the jet generation process
04generating single droplets or particles on demand
06by electric or magnetic field
B41J 2/09 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
2Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
005characterised by bringing liquid or particles selectively into contact with a printing material
01Ink jet
07characterised by jet control
075for many-valued deflection
08charge-control type
09Deflection means
C12Q 1/00 2006.01
CCHEMISTRY; METALLURGY
12BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
QMEASURING OR TESTING PROCESSES INVOLVING ENZYMES, NUCLEIC ACIDS OR MICROORGANISMS; COMPOSITIONS OR TEST PAPERS THEREFOR; PROCESSES OF PREPARING SUCH COMPOSITIONS; CONDITION-RESPONSIVE CONTROL IN MICROBIOLOGICAL OR ENZYMOLOGICAL PROCESSES
1Measuring or testing processes involving enzymes, nucleic acids or microorganisms; Compositions therefor; Processes of preparing such compositions
C23C 4/12 2016.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
4Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
12characterised by the method of spraying
G01N 27/62 2006.01
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
27Investigating or analysing materials by the use of electric, electro-chemical, or magnetic means
62by investigating the ionisation of gases; by investigating electric discharges, e.g. emission of cathode
H05K 3/12 2006.01
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
3Apparatus or processes for manufacturing printed circuits
10in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
12using printing techniques to apply the conductive material
Applicants
  • THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS [US]/[US]
Inventors
  • SUBRAMANIAN, Arunkumar
Agents
  • SANTOS, Daniel J.
Priority Data
62/842,25902.05.2019US
62/846,89213.05.2019US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) ATOMIC-TO-NANOSCALE MATTER EMISSION/FLOW REGULATION DEVICES AND METHODS
(FR) DISPOSITIFS ET PROCÉDÉS DE RÉGULATION DE FLUX/ÉMISSION DE MATIÈRE À L'ÉCHELLE ATOMIQUE À NANOMÉTRIQUE
Abstract
(EN)
Atomic-to-Nanoscale Matter Emission/Flow Regulation Devices, Systems and methods are set forth. An exemplary device can include a through-hole that has a top, and a nozzle configured to facilitate atomic-to-nanoscale matter emission/flow regulation formed in an etchable nozzle substrate. The nozzle can be configured at the smallest cross-section of the through-hole. A bottom can be formed in the nozzle substrate or selectively connected to the nozzle. Systems can include matter transportation / flow regulation columns, printing systems, etching systems and the like through which self-aligned nanodroplets or single-to-finite numbered ionic species / gas phase matter can flow under spontaneous or external excitation conditions (such as voltages) at atmospheric as well as regulated pressures.
(FR)
L'invention concerne des dispositifs, des systèmes et des procédés de régulation de flux/émission de matière à l'échelle atomique à nanométrique. Un dispositif donné à titre d'exemple peut comprendre un trou traversant qui a une partie supérieure et une buse conçue pour faciliter une régulation de flux/émission de matière à l'échelle atomique à nanométrique formée dans un substrat de buse pouvant être gravé. La buse peut être conçue au niveau de la plus petite section transversale du trou traversant. Un fond peut être formé dans le substrat de buse ou relié sélectivement à la buse. Les systèmes peuvent comprendre des colonnes de régulation de flux/transport de matière, des systèmes d'impression, des systèmes de gravure et analogues à travers lesquels des nanogouttelettes auto-alignées ou une matière de phase gazeuse/d'espèce ionique numérotée à un nombre unique à fini peuvent circuler dans des conditions d'excitation spontanée ou externe (telles que des tensions) à la pression atmosphérique ainsi qu'à des pressions régulées.
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