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1. WO2020202944 - ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN FILM, PATTERN-FORMING METHOD, AND ELECTRONIC DEVICE PRODUCTION METHOD

Publication Number WO/2020/202944
Publication Date 08.10.2020
International Application No. PCT/JP2020/008266
International Filing Date 28.02.2020
IPC
C07D 207/16 2006.01
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
DHETEROCYCLIC COMPOUNDS
207Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
02with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
04having no double bonds between ring members or between ring members and non-ring members
10with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
16Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
C07D 211/60 2006.01
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
DHETEROCYCLIC COMPOUNDS
211Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
04with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
06having no double bonds between ring members or between ring members and non-ring members
36with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
60Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
C07D 211/62 2006.01
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
DHETEROCYCLIC COMPOUNDS
211Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
04with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
06having no double bonds between ring members or between ring members and non-ring members
36with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
60Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
62attached in position 4
C07D 405/12 2006.01
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
DHETEROCYCLIC COMPOUNDS
405Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
02containing two hetero rings
12linked by a chain containing hetero atoms as chain links
C07D 411/12 2006.01
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
DHETEROCYCLIC COMPOUNDS
411Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen and sulfur atoms as the only ring hetero atoms
02containing two hetero rings
12linked by a chain containing hetero atoms as chain links
C07D 493/14 2006.01
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
DHETEROCYCLIC COMPOUNDS
493Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system
12in which the condensed system contains three hetero rings
14Ortho-condensed systems
Applicants
  • 富士フイルム株式会社 FUJIFILM CORPORATION [JP]/[JP]
Inventors
  • 畠山 直也 HATAKEYAMA Naoya
  • 米久田 康智 YONEKUTA Yasunori
  • 冨賀 敬充 TOMIGA Takamitsu
  • 東 耕平 HIGASHI Kohei
Agents
  • 中島 順子 NAKASHIMA Junko
  • 米倉 潤造 YONEKURA Junzo
  • 藤森 義真 FUJIMORI Yoshinao
  • 上出 真紀 KAMIDE Maki
Priority Data
2019-06881029.03.2019JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN FILM, PATTERN-FORMING METHOD, AND ELECTRONIC DEVICE PRODUCTION METHOD
(FR) COMPOSITION DE RÉSINE SENSIBLE À LA LUMIÈRE ACTIVE OU AU RAYONNEMENT, FILM DE RÉSINE SENSIBLE À LA LUMIÈRE ACTIVE OU AU RAYONNEMENT, PROCÉDÉ DE FORMATION DE MOTIF, ET PROCÉDÉ DE PRODUCTION DE DISPOSITIF ÉLECTRONIQUE
(JA) 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、及び電子デバイスの製造方法
Abstract
(EN)
Provided is an active light-sensitive or radiation-sensitive resin composition, etc., that is capable of forming a pattern having an extremely excellent rectangular shape in the cross-section thereof, when forming a pattern having an extremely high cross-section aspect ratio from a thick active light-sensitive radiation-sensitive film. This active light-sensitive or radiation-sensitive resin composition includes: a resin (A) having increased polarity due to the use of acid; a compound (B) generating acid as a result of irradiation by active light or radiation; and a compound (C) indicated by a specific structure and having a molecular weight of at least 220.
(FR)
L'invention concerne une composition de résine sensible à la lumière active ou sensible au rayonnement, etc, qui est capable de former un motif ayant une forme rectangulaire extrêmement excellente dans sa section transversale, lors de la formation d'un motif ayant un rapport d'aspect de section transversale extrêmement élevé à partir d'un film épais sensible à la lumière active, sensible au rayonnement. Cette composition de résine sensible à la lumière active ou sensible au rayonnement comprend : une résine (A) ayant une polarité accrue en raison de l'utilisation d'acide ; un composé (B) générant de l'acide suite à une irradiation par une lumière ou un rayonnement actif ; et un composé (C) indiqué par une structure spécifique et ayant un poids moléculaire d'au moins 220.
(JA)
厚膜の感活性光線性感放射線性膜から断面形状のアスペクト比が非常に高いパターンを形成する場合において、断面形状の矩形性に非常に優れたパターンを形成可能な感活性光線性又は感放射線性樹脂組成物等を提供する。感活性光線性又は感放射線性樹脂組成物は、(A)酸の作用により極性が増大する樹脂、(B)活性光線又は放射線の照射により酸を発生する化合物、及び、(C)特定の構造で表される分子量が220以上の化合物を含む。
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