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1. WO2020202604 - SPUTTERING TARGET AND METHOD FOR MANUFACTURING SPUTTERING TARGET

Publication Number WO/2020/202604
Publication Date 08.10.2020
International Application No. PCT/JP2019/037143
International Filing Date 20.09.2019
IPC
C23C 14/34 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
B22F 3/10 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
22CASTING; POWDER METALLURGY
FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
3Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor
10Sintering only
C04B 35/00 2006.01
CCHEMISTRY; METALLURGY
04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
BLIME; MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
35Shaped ceramic products characterised by their composition; Ceramic compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
C22C 1/05 2006.01
CCHEMISTRY; METALLURGY
22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
CALLOYS
1Making non-ferrous alloys
04by powder metallurgy
05Mixtures of metal powder with non-metallic powder
C22C 5/04 2006.01
CCHEMISTRY; METALLURGY
22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
CALLOYS
5Alloys based on noble metals
04Alloys based on a platinum group metal
C22C 19/07 2006.01
CCHEMISTRY; METALLURGY
22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
CALLOYS
19Alloys based on nickel or cobalt
07based on cobalt
Applicants
  • JX金属株式会社 JX NIPPON MINING & METALS CORPORATION [JP]/[JP]
Inventors
  • 古谷 祐樹 FURUYA,Yuki
Agents
  • アクシス国際特許業務法人 AXIS PATENT INTERNATIONAL
Priority Data
2019-06939329.03.2019JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) SPUTTERING TARGET AND METHOD FOR MANUFACTURING SPUTTERING TARGET
(FR) CIBLE DE PULVÉRISATION ET PROCÉDÉ DE FABRICATION DE CIBLE DE PULVÉRISATION
(JA) スパッタリングターゲット及びスパッタリングターゲットの製造方法
Abstract
(EN)
Provided are a sputtering target in which the occurrence of particles can be reduced, and which has improved uniformity, and a method for manufacturing the sputtering target. The present invention provides a sputtering target characterized by including 10 mol% to 85 mol% Co, 0 mol% to 47 mol% Pt, and 0 mol% to 47 mol% Cr as metal components, and by including at least B6O as an oxide component.
(FR)
L'invention concerne une cible de pulvérisation dans laquelle l'apparition de particules peut être réduite, et qui présente une uniformité améliorée, et un procédé de fabrication de la cible de pulvérisation. La présente invention concerne une cible de pulvérisation caractérisée en ce qu'elle comprend de 10 % en moles à 85 % en moles de Co, de 0 % en moles à 47 % en moles de Pt, et 0 % en moles à 47 % en moles de Cr en tant que composants métalliques, et en incluant au moins B6O en tant que composant oxyde.
(JA)
パーティクルの発生を低減でき、より均質なスパッタリングターゲット及びその製造方法を提供する。金属成分としてCoを10mol%以上85mol%以下、Ptを0mol%以上47mol%以下、Crを0mol%以上47mol%以下含み、酸化物成分として少なくともB6Oを含むことを特徴とするスパッタリングターゲットである。
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