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1. WO2020201530 - LASER FOCUSSING MODULE

Publication Number WO/2020/201530
Publication Date 08.10.2020
International Application No. PCT/EP2020/059614
International Filing Date 03.04.2020
IPC
H05G 2/00 2006.01
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
GX-RAY TECHNIQUE
2Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
H01S 3/00 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
3Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
CPC
H01S 3/005
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
3Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
005Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
H05G 2/008
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
GX-RAY TECHNIQUE
2Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
001X-ray radiation generated from plasma
008involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
Applicants
  • ASML NETHERLANDS B.V. [NL]/[NL]
  • TRUMPF LASERSYSTEMS FOR SEMICONDUCTOR MANUFACTURING GMBH [DE]/[DE]
Inventors
  • BEERENS, Ruud, Antonius, Catharina, Maria
  • YUAN, Jiayue
  • BOONEN, Nico, Johannes, Antonius, Hubertus
  • LAMBERT, Martin Anton
  • HOPF, Andreas Kristian
  • PIEHLER, Stefan
  • ERGIN, Tolga Mehmet
  • BÄUMER, Stefan, Michael, Bruno
  • KLUNDER, Derk, Jan, Wilfred
  • RANJAN, Manisha
  • SPERLING, Frank, Bernhard
  • TYCHKOV, Andrey, Sergeevich
  • WITTE, Jasper
Agents
  • SLENDERS, Petrus
Priority Data
19167261.704.04.2019EP
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) LASER FOCUSSING MODULE
(FR) MODULE DE MISE AU POINT LASER
Abstract
(EN)
A laser focusing system (330) for use in an EUV radiation source is described, the laser focusing system comprising: • - a first curved mirror (330.1) configured to receive a laser beam from a beam delivery system (320) and generate a first reflected laser beam (316); • - a second curved mirror (330.2) configured to receive the first reflected laser beam (316) and generate a second reflected laser beam (317), wherein the laser focusing system (330) is configured to focus the second reflected laser beam (317) to a target location (340) in a vessel (350) of the EUV radiation source (360).
(FR)
L'invention concerne un système de mise au point laser (330) destiné à être utilisé dans une source de rayonnement EUV. Le système de mise au point laser comprend : un premier miroir incurvé (330.1) conçu pour recevoir un faisceau laser provenant d'un système de distribution de faisceau (320) et pour générer un premier faisceau laser réfléchi (316); un second miroir incurvé (330.2) conçu pour recevoir le premier faisceau laser réfléchi (316) et pour générer un second faisceau laser réfléchi (317), le système de mise au point laser (330) étant conçu pour focaliser le second faisceau laser réfléchi (317) sur un emplacement cible (340) dans un récipient (350) de la source de rayonnement EUV (360).
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