Processing

Please wait...

PATENTSCOPE will be unavailable a few hours for maintenance reason on Saturday 31.10.2020 at 7:00 AM CET
Settings

Settings

Goto Application

1. WO2020198012 - SINGLE BEAM PLASMA SOURCE

Publication Number WO/2020/198012
Publication Date 01.10.2020
International Application No. PCT/US2020/023869
International Filing Date 20.03.2020
IPC
H01J 37/08 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
08Ion sources; Ion guns
H01J 37/34 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes
34operating with cathodic sputtering
Applicants
  • BOARD OF TRUSTEES OF MICHIGAN STATE UNIVERSITY [US]/[US]
Inventors
  • FAN, Qi Hua
Agents
  • FALCOFF, Monte L.
Priority Data
62/823,87226.03.2019US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) SINGLE BEAM PLASMA SOURCE
(FR) SOURCE DE PLASMA À FAISCEAU UNIQUE
Abstract
(EN)
A single beam plasma or ion source apparatus (21, 821, 921), including multiple and different power sources, is provided. An aspect of the present apparatus and method employs simultaneous excitation of an ion source by DC and AC, or DC and RF power supplies (607, 615, 810, 812, 910, 912). Another aspect employs an ion source including multiple magnets (91, 891) and magnetic shunts (93, 893) arranged in a generally E cross-sectional shape.
(FR)
L'invention concerne un appareil de source d'ions ou de plasma à faisceau unique (21, 821, 921), comprenant des sources d'alimentation multiples et différentes. Un aspect de l'appareil et du procédé de la présente invention utilise l'excitation simultanée d'une source d'ions par des alimentations CC et CA, ou CC et RF (607, 615, 810, 812 910, 912). Un autre aspect utilise une source d'ions comprenant de multiples aimants (91, 891) et des shunts magnétiques (93, 893) disposés selon une forme de section transversale généralement en E.
Latest bibliographic data on file with the International Bureau