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1. WO2020197837 - OPTICAL SYSTEM FOR MONITORING PLASMA REACTIONS AND REACTORS

Publication Number WO/2020/197837
Publication Date 01.10.2020
International Application No. PCT/US2020/023057
International Filing Date 17.03.2020
IPC
H01J 37/32 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes
CPC
B01J 19/12
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
19Chemical, physical or physico-chemical processes in general; Their relevant apparatus
08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
12employing electromagnetic waves
C23C 16/511
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
44characterised by the method of coating
50using electric discharges
511using microwave discharges
G01J 1/0425
GPHYSICS
01MEASURING; TESTING
JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
1Photometry, e.g. photographic exposure meter
02Details
04Optical or mechanical part ; supplementary adjustable parts
0407Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
0425using optical fibers
G01J 1/0492
GPHYSICS
01MEASURING; TESTING
JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
1Photometry, e.g. photographic exposure meter
02Details
04Optical or mechanical part ; supplementary adjustable parts
0488with spectral filtering
0492using at least two different filters
G01J 1/4228
GPHYSICS
01MEASURING; TESTING
JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
1Photometry, e.g. photographic exposure meter
42using electric radiation detectors
4228arrangements with two or more detectors, e.g. for sensitivity compensation
G01J 1/429
GPHYSICS
01MEASURING; TESTING
JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
1Photometry, e.g. photographic exposure meter
42using electric radiation detectors
429applied to measurement of ultraviolet light
Applicants
  • RECARBON, INC. [US]/[US]
Inventors
  • TOM, Curtis Peter
  • XIE, Fei
  • LI, Wei
  • MCCLELLAND, Stefan Andrew
Agents
  • PARK, Chung Sik
Priority Data
16/820,66916.03.2020US
62/823,43625.03.2019US
62/823,48425.03.2019US
62/823,49225.03.2019US
62/823,50525.03.2019US
62/823,50825.03.2019US
62/823,51425.03.2019US
62/823,51725.03.2019US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) OPTICAL SYSTEM FOR MONITORING PLASMA REACTIONS AND REACTORS
(FR) SYSTÈME OPTIQUE DE SURVEILLANCE DE RÉACTIONS PLASMATIQUES ET DE RÉACTEURS À PLASMA
Abstract
(EN)
The present invention provides a plasma generating system (10) that includes: a waveguide (20); a plasma cavity coupled to the waveguide (20) and configured to generate a plasma therewithin by use of microwave energy; a hollow cylinder (13) protruding from a wall of the waveguide (20) and having a bottom cap that has an aperture (66); a detection unit (61) for receiving the light emitted by the plasma (46) through the aperture (66) and configured to measure intensities of the light in an ultraviolet (UV) range and an infrared (IR) range; and a controller (69) for controlling the detection unit (61).
(FR)
La présente invention concerne un système de génération de plasma (10) qui comprend : un guide d'ondes (20) ; une cavité à plasma couplée au guide d'ondes (20) et configurée pour générer un plasma à l'intérieur de celle-ci par utilisation d'énergie hyperfréquence ; un cylindre creux (13) faisant saillie d'une paroi du guide d'ondes (20) et ayant un capuchon inférieur qui comporte une ouverture (66) ; une unité de détection (61) pour recevoir la lumière émise par le plasma (46) à travers l'ouverture (66) et configurée pour mesurer des intensités de la lumière dans un domaine ultraviolet (UV) et un domaine infrarouge (IR) ; et un dispositif de commande (69) pour commander l'unité de détection (61).
Also published as
Latest bibliographic data on file with the International Bureau