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1. WO2020197701 - PLASMA REACTOR FOR PROCESSING GAS

Publication Number WO/2020/197701
Publication Date 01.10.2020
International Application No. PCT/US2020/020556
International Filing Date 29.02.2020
IPC
H01J 37/32 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes
CPC
B01J 19/12
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
19Chemical, physical or physico-chemical processes in general; Their relevant apparatus
08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
12employing electromagnetic waves
C23C 16/511
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
44characterised by the method of coating
50using electric discharges
511using microwave discharges
G01J 1/0425
GPHYSICS
01MEASURING; TESTING
JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
1Photometry, e.g. photographic exposure meter
02Details
04Optical or mechanical part ; supplementary adjustable parts
0407Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
0425using optical fibers
G01J 1/0492
GPHYSICS
01MEASURING; TESTING
JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
1Photometry, e.g. photographic exposure meter
02Details
04Optical or mechanical part ; supplementary adjustable parts
0488with spectral filtering
0492using at least two different filters
G01J 1/4228
GPHYSICS
01MEASURING; TESTING
JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
1Photometry, e.g. photographic exposure meter
42using electric radiation detectors
4228arrangements with two or more detectors, e.g. for sensitivity compensation
G01J 1/429
GPHYSICS
01MEASURING; TESTING
JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
1Photometry, e.g. photographic exposure meter
42using electric radiation detectors
429applied to measurement of ultraviolet light
Applicants
  • RECARBON, INC. [US]/[US]
Inventors
  • MCCLELLAND, Stefan Andrew
  • LEONARD III, George Stephen
  • KOO, Jae Mo
Agents
  • PARK, Chung Sik
Priority Data
16/752,68926.01.2020US
62/823,43625.03.2019US
62/823,48425.03.2019US
62/823,49225.03.2019US
62/823,50525.03.2019US
62/823,50825.03.2019US
62/823,51425.03.2019US
62/823,51725.03.2019US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) PLASMA REACTOR FOR PROCESSING GAS
(FR) RÉACTEUR À PLASMA POUR TRAITEMENT DE GAZ
Abstract
(EN)
The present invention provides a plasma generating system (10) that includes: a waveguide (20) for transmitting a microwave energy therethrough; an inner wall (40) disposed within the waveguide (20) to define a plasma cavity, wherein a plasma (46) is generated within the plasma cavity using the microwave energy; a first gas inlet (44) mounted on a first side of the waveguide (20) and configured to introduce a first gas into the plasma cavity and generate a first vortex flow (45) within the plasma cavity using the first gas, the first gas inlet (44) having a hole (32) through which a gas processed by the plasma (46) exits the plasma cavity; and a plasma stabilizer (38) having a shape of a circular hollow cylinder and installed on a second side of the waveguide (20), an axial direction of the plasma stabilizer (38) being in parallel to a rotational axis of the first vortex flow (45).
(FR)
La présente invention concerne un système de production de plasma (10) qui comprend : un guide d'ondes (20) pour transmettre une énergie à micro-onde à travers celui-ci; une paroi intérieure (40) disposée dans le guide d'ondes (20) pour délimiter une cavité de plasma, un plasma (46) étant produit dans la cavité de plasma à l'aide de l'énergie à micro-onde; une première entrée de gaz (44) montée sur un premier côté du guide d'ondes (20) et conçue pour introduire un premier gaz dans la cavité de plasma et produire un premier écoulement tourbillonnaire (45) dans la cavité de plasma à l'aide du premier gaz, la première entrée de gaz (44) comportant un trou (32) par lequel un gaz traité par le plasma (46) sort de la cavité de plasma; et un stabilisateur de plasma (38) ayant la forme d'un cylindre creux circulaire et installé sur un second côté du guide d'ondes (20), une direction axiale du stabilisateur de plasma (38) étant parallèle à un axe de rotation du premier écoulement tourbillonnaire (45).
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