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1. WO2020197299 - SUBSTRATE MANUFACTURING SYSTEM, SUBSTRATE WIRING PATTERN, DISPLAY PANEL, AND METHOD FOR MANUFACTURING SAME

Publication Number WO/2020/197299
Publication Date 01.10.2020
International Application No. PCT/KR2020/004151
International Filing Date 26.03.2020
IPC
G03F 7/16 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
16Coating processes; Apparatus therefor
G03F 7/34 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26Processing photosensitive materials; Apparatus therefor
34Imagewise removal by selective transfer, e.g. peeling away
G03F 7/00 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
H01L 21/02 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
H01L 21/768 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
70Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in or on a common substrate or of specific parts thereof; Manufacture of integrated circuit devices or of specific parts thereof
71Manufacture of specific parts of devices defined in group H01L21/7086
768Applying interconnections to be used for carrying current between separate components within a device
Applicants
  • 정부기 JEONG, Boogie [KR]/[KR]
  • 박만금 PARK, Man Kum [KR]/[KR]
Inventors
  • 정부기 JEONG, Boogie
  • 박만금 PARK, Man Kum
Agents
  • 김기문 KIM, Ki Moon
Priority Data
10-2019-003403126.03.2019KR
10-2019-003403626.03.2019KR
10-2019-006180527.05.2019KR
Publication Language Korean (KO)
Filing Language Korean (KO)
Designated States
Title
(EN) SUBSTRATE MANUFACTURING SYSTEM, SUBSTRATE WIRING PATTERN, DISPLAY PANEL, AND METHOD FOR MANUFACTURING SAME
(FR) SYSTÈME DE FABRICATION DE SUBSTRAT, MOTIF DE CÂBLAGE DE SUBSTRAT, PANNEAU D'AFFICHAGE ET SON PROCÉDÉ DE FABRICATION
(KO) 기판 제조 시스템, 기판의 배선패턴, 표시패널 및 그 제조방법
Abstract
(EN)
An embodiment of the invention relates to a system and a method for manufacturing a substrate. The system for manufacturing a substrate according to an embodiment of the invention comprises a base, a coating unit, an exposure unit, and a development unit. The coating unit forms an initial wiring by using conductive ink. The exposure unit moves relative to the base along the initial wiring, and irradiates at least a part of the conductive ink with a laser beam or lamplight.
(FR)
Selon un mode de réalisation, l'invention concerne un système et un procédé de fabrication d'un substrat. Le système de fabrication d'un substrat selon un mode de réalisation de l'invention comprend une base, une unité de revêtement, une unité d'exposition et une unité de développement. L'unité de revêtement forme un câblage initial en utilisant de l'encre conductrice. L'unité d'exposition se déplace par rapport à la base le long du câblage initial, et irradie au moins une partie de l'encre conductrice avec un faisceau laser ou une lumière de lampe.
(KO)
발명의 실시 예는 기판 제조시스템 및 제조방법에 관한 것이다. 발명의 실시 예에 따른 기판 제조시스템은, 베이스, 도장유닛, 노광유닛 및 현상유닛이 포함된다. 상기 도장유닛은 전도성 잉크로 초기배선을 형성한다. 상기 노광유닛은 상기 초기배선을 따라 상기 베이스에 대하여 상대이동되며, 상기 전도성 잉크의 적어도 일부에 레이저 빔 또는 램프를 조사한다.
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