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1. WO2020197014 - PHOTORESIST-REMOVING STRIPPER COMPOSITION AND METHOD FOR STRIPPING PHOTORESIST USING SAME

Publication Number WO/2020/197014
Publication Date 01.10.2020
International Application No. PCT/KR2019/013124
International Filing Date 07.10.2019
IPC
G03F 7/42 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26Processing photosensitive materials; Apparatus therefor
42Stripping or agents therefor
C11D 11/00 2006.01
CCHEMISTRY; METALLURGY
11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
11Special methods for preparing compositions containing mixtures of detergents
C11D 3/28 2006.01
CCHEMISTRY; METALLURGY
11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
3Other compounding ingredients of detergent compositions covered in group C11D1/101
16Organic compounds
26containing nitrogen
28Heterocyclic compounds containing nitrogen in the ring
C11D 3/30 2006.01
CCHEMISTRY; METALLURGY
11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
3Other compounding ingredients of detergent compositions covered in group C11D1/101
16Organic compounds
26containing nitrogen
30Amines; Substituted amines
C11D 3/32 2006.01
CCHEMISTRY; METALLURGY
11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
3Other compounding ingredients of detergent compositions covered in group C11D1/101
16Organic compounds
26containing nitrogen
32Amides; Substituted amides
C11D 3/43 2006.01
CCHEMISTRY; METALLURGY
11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
3Other compounding ingredients of detergent compositions covered in group C11D1/101
43Solvents
Applicants
  • 주식회사 엘지화학 LG CHEM, LTD. [KR]/[KR]
Inventors
  • 박태문 PARK, Tae Moon
  • 이동훈 LEE, Dong Hoon
  • 송현우 SONG, Hyun Woo
  • 이우람 LEE, Woo Ram
Agents
  • 유미특허법인 YOU ME PATENT AND LAW FIRM
Priority Data
10-2019-003320422.03.2019KR
Publication Language Korean (KO)
Filing Language Korean (KO)
Designated States
Title
(EN) PHOTORESIST-REMOVING STRIPPER COMPOSITION AND METHOD FOR STRIPPING PHOTORESIST USING SAME
(FR) COMPOSITION DÉCAPANTE D'ÉLIMINATION DE RÉSINE PHOTOSENSIBLE ET PROCÉDÉ DE DÉCAPAGE DE RÉSINE PHOTOSENSIBLE L'UTILISANT
(KO) 포토레지스트 제거용 스트리퍼 조성물 및 이를 이용한 포토레지스트의 박리방법
Abstract
(EN)
The present invention relates to a photoresist-removing stripper composition and a method for stripping photoresist using same, wherein the photoresist-removing stripper composition has excellent photoresist stripping power, inhibits corrosion of a lower metal film during a stripping process, and is capable of effectively removing oxides.
(FR)
La présente invention concerne une composition décapante d'élimination de résine photosensible et un procédé de décapage de résine photosensible l'utilisant, la composition décapante d'élimination de résine photosensible ayant une excellente puissance de décapage de résine photosensible, inhibant la corrosion d'un film métallique inférieur au cours d'un processus de décapage, et pouvant éliminer efficacement les oxydes.
(KO)
본 발명은 포토레지스트에 대한 우수한 박리력을 가지면서 박리과정에서 하부 금속막에 대한 부식을 억제하고, 산화물을 효과적으로 제거할 수 있는 포토레지스트 제거용 스트리퍼 조성물 및 이를 이용한 포토레지스트의 박리방법에 관한 것이다.
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