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1. WO2020196820 - FLEXOGRAPHIC PRINTING PLATE DEVELOPING SOLUTION COMPOSITION, DEVELOPING SOLUTION, AND METHOD OF MANUFACTURING ORIGINAL PRINTING PLATE

Publication Number WO/2020/196820
Publication Date 01.10.2020
International Application No. PCT/JP2020/013962
International Filing Date 27.03.2020
IPC
G03F 7/00 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F 7/095 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
09characterised by structural details, e.g. supports, auxiliary layers
095having more than one photosensitive layer
G03F 7/11 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
09characterised by structural details, e.g. supports, auxiliary layers
11having cover layers or intermediate layers, e.g. subbing layers
G03F 7/32 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26Processing photosensitive materials; Apparatus therefor
30Imagewise removal using liquid means
32Liquid compositions therefor, e.g. developers
Applicants
  • 東洋紡株式会社 TOYOBO CO., LTD. [JP]/[JP]
Inventors
  • 山田 裕登 YAMADA, Hiroto
Agents
  • 風早 信昭 KAZAHAYA, Nobuaki
  • 浅野 典子 ASANO, Noriko
Priority Data
2019-06370028.03.2019JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) FLEXOGRAPHIC PRINTING PLATE DEVELOPING SOLUTION COMPOSITION, DEVELOPING SOLUTION, AND METHOD OF MANUFACTURING ORIGINAL PRINTING PLATE
(FR) COMPOSITION DE SOLUTION DE DÉVELOPPEMENT DE PLAQUE D'IMPRESSION FLEXOGRAPHIQUE, SOLUTION DE DÉVELOPPEMENT ET PROCÉDÉ DE FABRICATION DE PLAQUE D'IMPRESSION ORIGINALE
(JA) フレキソ印刷版用現像液組成物、現像液および印刷原版の製造方法
Abstract
(EN)
Provided is a developing solution composition that achieves a high development speed even with a fine brush and can achieve, at a high level, solutions for the conventional issues of image reproductability and dispersion of a non-photo crosslinking photosensitive resin and an image masking layer in a photosensitive resin layer. This developing solution composition for water-developable, photosensitive flexographic original printing plates is characterized by: containing (a) a non-ionic surfactant of polyethylene glycol monoalkyl ether and/or monoalkyl ester having a C8–19 alkyl group and an HLB value of 11–16 and (b) at least one type of anionic surfactant selected from the group consisting of oleic acid metal salt, lauric acid metal salt, dodecylbenzene sulfonic acid metal salt, and lauryl sulfate metal salt, whereby (a):(b) is 25:75–75:25 (mass ratio); and the brush friction coefficient on an original printing plate surface being 0.60–0.75 [-] in an aqueous developing solution containing 1% by mass developing solution composition and 99% by mass water.
(FR)
L'invention concerne une composition de solution de développement qui permet un développement très rapide même avec une brosse fine et qui offre des solutions de haut niveau aux problèmes classiques de reproductibilité d'image et de dispersion d'une résine photosensible non photoréticulaire et une couche de masquage d'image dans une couche de résine photosensible. Cette composition de solution de développement pour plaques originales d'impression flexographique photosensibles et développables à l'eau est caractérisée en ce qu'elle contient (a) un tensioactif non ionique d'éther monoalkylique de polyéthylène glycol et/ou d'ester monoalkylique ayant un groupe alkyle en C8-19 et une valeur HLB entre 11 et 16 et (b) au moins un type de tensioactif anionique choisi dans le groupe constitué par un sel métallique d'acide oléique, un sel métallique d'acide laurique, un sel métallique d'acide sulfonique dodécylbenzène, et un sel métallique de sulfate de lauryle, le rapport de masse de (a) : (b) étant de 25 : 75 à 75 : 25 ; et le coefficient de frottement de brosse sur une surface de plaque d'impression originale étant de 0,60 à 0,75 [-] dans une solution de développement aqueuse contenant 1 % en masse de composition de solution de développement et 99 % en masse d'eau.
(JA)
細ブラシでも高い現像速度を満足しつつ、従来からの課題であった画像再現性、感光性樹脂層中の未光架橋感光性樹脂及び画像マスク層の分散性の全てを高いレベルで満足できる現像液組成物を提供する。水現像可能な感光性フレキソ印刷原版用の現像液組成物であって、現像液組成物が、(a)アルキル基が炭素数8~19であり、且つHLB値が11~16であるポリエチレングリコールのモノアルキルエーテル及び/又はモノアルキルエステルのノニオン系界面活性剤、及び(b)オレイン酸金属塩、ラウリル酸金属塩、ドデシルベンセンスルホン酸金属塩、及びラウリル硫酸金属塩からなる群から選択される一種以上のアニオン系界面活性剤を、(a):(b)が25:75~75:25(質量比)で含有すること、及び現像液組成物を1質量%含有し、水を99質量%含有する水性現像液中での印刷原版表面のブラシ摩擦係数が0.60~0.75[-]の範囲である。
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