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1. WO2020196667 - POLYMER, RESIST COMPOSITION, METHOD FOR MANUFACTURING SUBSTRATE HAVING PATTERN FORMED THEREIN, AND (METH)ACRYLIC ESTER AND PRODUCTION METHOD THEREFOR

Publication Number WO/2020/196667
Publication Date 01.10.2020
International Application No. PCT/JP2020/013457
International Filing Date 25.03.2020
IPC
C07D 333/48 2006.01
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
DHETEROCYCLIC COMPOUNDS
333Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
02not condensed with other rings
46substituted on the ring sulfur atom
48by oxygen atoms
C08F 220/38 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10Esters
38Esters containing sulfur
C07B 61/00 2006.01
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
BGENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
61Other general methods
G03F 7/039 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
039Macromolecular compounds which are photodegradable, e.g. positive electron resists
Applicants
  • 三菱ケミカル株式会社 MITSUBISHI CHEMICAL CORPORATION [JP]/[JP]
Inventors
  • 向井 一晃 MUKAI Kazuaki
  • 城 健 JO Takeru
  • 加門 良啓 KAMON Yoshihiro
  • 佐久間 諭 SAKUMA Satoshi
  • 安齋 竜一 ANSAI Ryuichi
Agents
  • 田▲崎▼ 聡 TAZAKI Akira
  • 伏見 俊介 FUSHIMI Shunsuke
  • 大浪 一徳 ONAMI Kazunori
Priority Data
2019-05990927.03.2019JP
2019-05991027.03.2019JP
2019-06049027.03.2019JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) POLYMER, RESIST COMPOSITION, METHOD FOR MANUFACTURING SUBSTRATE HAVING PATTERN FORMED THEREIN, AND (METH)ACRYLIC ESTER AND PRODUCTION METHOD THEREFOR
(FR) POLYMÈRE, COMPOSITION DE RÉSINE PHOTOSENSIBLE, PROCÉDÉ DE FABRICATION D'UN SUBSTRAT AYANT UN MOTIF FORMÉ À L'INTÉRIEUR DE CELUI-CI, ESTER (MÉTH)ACRYLIQUE ET PROCÉDÉ DE PRODUCTION ASSOCIÉ
(JA) 重合体、レジスト組成物、パターンが形成された基板の製造方法、並びに(メタ)アクリル酸エステル及びその製造方法
Abstract
(EN)
This polymer includes a structural unit (1) based on a monomer represented by formula (1), wherein the contained amount of a structural unit based on a monomer having a polycyclic structure is 35 mol% or less. In formula (1): R1 represents a hydrogen atom or a methyl group; A1 represents a single bond or a bonding group including an ester bond, but A1 does not have a tertiary carbon atom; and Z1 represents an atomic group forming a sulfur-containing cyclic hydrocarbon group having 3-6 carbon atoms, including -SO2- and a carbon atom bound to A1.
(FR)
L'invention concerne un polymère qui comprend une unité (1) structurale sur la base d'un monomère représenté par la formule (1), la quantité contenue d'une unité structurale sur la base d'un monomère ayant une structure polycyclique étant de 35 % en moles ou moins. Dans la formule (1), R1 représente un atome d'hydrogène ou un groupe méthyle ; A1 représente une liaison simple ou un groupe de liaison comprenant une liaison ester, mais A1 ne possède pas d'atome de carbone tertiaire ; et Z1 représente un groupe atomique formant un groupe hydrocarboné cyclique contenant du soufre ayant de 3 à 6 atomes de carbone, comprenant -SO2- et un atome de carbone lié à A1.
(JA)
式(1)で表される単量体に基づく構成単位(1)を含み、多環構造を有する単量体に基づく構成単位の含有量が35モル%以下である、重合体。式(1)中、Rは水素原子又はメチル基を表す;Aはエステル結合を含む連結基又は単結合を表す、ただし、Aは第3級炭素原子を有さない;Zは、Aと結合している炭素原子と-SO-とを含めて炭素数3~6の含硫黄環式炭化水素基を形成する原子団を表す。
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