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1. WO2020196563 - FILM-FORMING COMPOSITION

Publication Number WO/2020/196563
Publication Date 01.10.2020
International Application No. PCT/JP2020/013162
International Filing Date 24.03.2020
IPC
C08G 77/26 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
77Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon
04Polysiloxanes
22containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
26nitrogen-containing groups
C09D 5/00 2006.01
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
5Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
C08L 83/04 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
83Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Compositions of derivatives of such polymers
04Polysiloxanes
C09D 183/06 2006.01
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
183Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
04Polysiloxanes
06containing silicon bound to oxygen-containing groups
C09D 183/08 2006.01
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
183Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
04Polysiloxanes
08containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
G03F 7/11 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
09characterised by structural details, e.g. supports, auxiliary layers
11having cover layers or intermediate layers, e.g. subbing layers
Applicants
  • 日産化学株式会社 NISSAN CHEMICAL CORPORATION [JP]/[JP]
Inventors
  • 柴山 亘 SHIBAYAMA, Wataru
  • 武田 諭 TAKEDA, Satoshi
  • 志垣 修平 SHIGAKI, Shuhei
  • 石橋 謙 ISHIBASHI, Ken
  • 加藤 宏大 KATO, Kodai
  • 中島 誠 NAKAJIMA, Makoto
Agents
  • 特許業務法人はなぶさ特許商標事務所 HANABUSA PATENT & TRADEMARK OFFICE
Priority Data
2019-06379228.03.2019JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) FILM-FORMING COMPOSITION
(FR) COMPOSITION FILMOGÈNE
(JA) 膜形成用組成物
Abstract
(EN)
[Problem] To provide a film-forming composition that is suitable as a resist underlayer film-forming composition capable of forming a resist underlayer film with both good adhesion to an EUV resist and good etchability. [Solution] A film-forming composition including a solvent and at least one type of substance selected from a hydrolyzable silane compound, a hydrolysate thereof, and a hydrolysis condensate thereof, wherein the film-forming composition is characterized in that the hydrolyzable silane compound includes a hydrolyzable silane expressed by formula (1), which has an intramolecular cyano group. (In formula (1), R1 is a group bonding to a silicon atom, and represents an organic group including a cyano group, each R2 is a group bonding to a silicon atom by Si-C bonding, and independently represents a substitutable alkyl group or similar, each R3 is a group or atom bonding to a silicon atom, and independently represents a hydroxy group, an alkoxy group, an aralkyloxy group, an acyloxy group, or a halogen atom, a represents the integer 1, b represents an integer from 0 to 2, and a+b represents an integer from 1 to 3.)
(FR)
Le problème décrit par la présente invention est de fournir une composition filmogène qui est appropriée en tant que composition filmogène de sous-couche de réserve susceptible de former un film de sous-couche de réserve ayant à la fois une bonne adhérence à une réserve EUV et une bonne aptitude à la gravure. La solution selon l'invention porte sur une composition filmogène comprenant un solvant et au moins un type de substance choisie parmi un composé silane hydrolysable, un hydrolysat de celui-ci et un condensat d'hydrolyse de celui-ci, la composition filmogène étant caractérisée en ce que le composé silane hydrolysable comprend un silane hydrolysable exprimé par la formule (1), qui comporte un groupe cyano intramoléculaire. (Dans la formule (1), R1 représente un groupe se liant à un atome de silicium, et représente un groupe organique comprenant un groupe cyano, chaque R2 est un groupe se liant à un atome de silicium par liaison Si-C, et représente indépendamment un groupe alkyle pouvant être substitué ou similaire, chaque R3 est un groupe ou un atome se liant à un atome de silicium, et représente indépendamment un groupe hydroxy, un groupe alcoxy, un groupe aralkyloxy, un groupe acyloxy ou un atome d'halogène, a représente le nombre entier 1, b représente un nombre entier de 0 à 2, et a + b représente un nombre entier de 1 à 3.)
(JA)
【課題】EUVレジストへの良好な密着性と、良好なエッチング加工性とを併せ持つレジスト下層膜を形成できるレジスト下層膜形成用組成物として好適な、膜形成用組成物を提供すること。 【解決手段】加水分解性シラン化合物、その加水分解物及びその加水分解縮合物から選ばれる少なくとも1種と、溶媒とを含む膜形成用組成物であって、上記加水分解性シラン化合物が、シアノ基を分子内に有する下記式(1)で表される加水分解性シランを含むことを特徴とする、膜形成用組成物。 (式(1)中、Rは、ケイ素原子に結合する基であって、シアノ基を含む有機基を表し、Rは、Si-C結合によりケイ素原子に結合する基であって、互いに独立して、置換されていてもよいアルキル基等を表し、Rは、ケイ素原子に結合する基又は原子であって、互いに独立して、ヒドロキシ基、アルコキシ基、アラルキルオキシ基、アシルオキシ基又はハロゲン原子を表し、aは1の整数を表し、bは0乃至2の整数を表し、a+bは1乃至3の整数を表す。)
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