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1. WO2020195566 - V ALLOY TARGET

Publication Number WO/2020/195566
Publication Date 01.10.2020
International Application No. PCT/JP2020/008603
International Filing Date 02.03.2020
IPC
C23C 14/24 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
24Vacuum evaporation
B22F 1/00 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
22CASTING; POWDER METALLURGY
FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
1Special treatment of metallic powder, e.g. to facilitate working, to improve properties; Metallic powders per se, e.g. mixtures of particles of different composition
C22C 1/04 2006.01
CCHEMISTRY; METALLURGY
22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
CALLOYS
1Making non-ferrous alloys
04by powder metallurgy
C22C 27/02 2006.01
CCHEMISTRY; METALLURGY
22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
CALLOYS
27Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/ or C22C16/130
02Alloys based on vanadium, niobium or tantalum
C22C 27/04 2006.01
CCHEMISTRY; METALLURGY
22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
CALLOYS
27Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/ or C22C16/130
04Alloys based on tungsten or molybdenum
Applicants
  • 日立金属株式会社 HITACHI METALS,LTD. [JP]/[JP]
Inventors
  • 十亀 宏明 SOGAME Hiroaki
  • 福岡 淳 FUKUOKA Jun
Priority Data
2019-05753226.03.2019JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) V ALLOY TARGET
(FR) CIBLE EN ALLIAGE DE V
(JA) V合金ターゲット
Abstract
(EN)
Provided is a novel V alloy target, wherein the occurrence of irregularities on the surface of the target can be suppressed during the machining of the target, and the deposition of droplets on workpieces can be suppressed while the occurrence of abnormal discharge is suppressed during film formation. The V alloy target is composed of V and W, wherein the average value of Vickers hardness on an erosion surface is in the range of 340-750 HV, and the variation in Vickers hardness measured at 5 measurement points is 20% or less. Preferably, the V alloy target has a Vickers hardness in the range of 350-710 HV, and more preferably contains 10-50 at% of W with the remainder comprising V and inevitable impurities.
(FR)
L'invention concerne une nouvelle cible en alliage de V, l'apparition d'irrégularités sur la surface de la cible pouvant être supprimée pendant l'usinage de la cible, et le dépôt de gouttelettes sur des pièces à usiner peut être supprimé tandis que l'apparition d'une décharge anormale est supprimée pendant la formation de film. La cible en alliage de V est composée de V et de W, la valeur moyenne de la dureté Vickers sur une surface d'érosion étant dans la plage de 340 à 750 HV, et la variation de la dureté Vickers mesurée à 5 points de mesure étant de 20 % ou moins. De préférence, la cible en alliage de V a une dureté Vickers dans la plage de 350-710 HV, et elle contient de manière davantage préférée de 10 à 50 % atomique de W, le reste comprenant du V et des impuretés inévitables.
(JA)
ターゲットの機械加工において、ターゲット表面における凹凸の発生が抑制でき、成膜時の異常放電の発生を抑制するとともに、被処理材へのドロップレットの付着抑制も同時に達成できる、新規なV合金ターゲットを提供する。 VおよびWで構成され、エロージョン面におけるビッカース硬さの平均値が340~750HVの範囲であり、5点の測定点で測定を行なったビッカース硬さのばらつきが20%以下であるV合金ターゲットであり、ビッカース硬さは350~710HVの範囲にあることが好ましく、Wを10~50原子%含有し、残部がVおよび不可避的不純物からなることがより好ましい。
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