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1. WO2020194267 - METHOD AND APPARARUS FOR PRINTING A PERIODIC PATTERN WITH A VARYING DUTY CYCLE

Publication Number WO/2020/194267
Publication Date 01.10.2020
International Application No. PCT/IB2020/052954
International Filing Date 27.03.2020
IPC
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
G02B 5/18 2006.01
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
18Diffracting gratings
CPC
G02B 5/1809
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
18Diffraction gratings
1809with pitch less than or comparable to the wavelength
G02B 5/1857
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
18Diffraction gratings
1847Manufacturing methods
1857using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
G03F 7/70408
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70375Imaging systems not otherwise provided for, e.g. multiphoton lithography; Imaging systems comprising means for converting one type of radiation into another type of radiation, systems comprising mask with photo-cathode
70408Interferometric lithography; Holographic lithography; Self-imaging lithography
Applicants
  • EULITHA A.G. [CH]/[CH] (AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BE, BF, BG, BH, BJ, BN, BR, BW, BY, BZ, CA, CF, CG, CH, CI, CL, CM, CN, CO, CR, CU, CY, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, FR, GA, GB, GD, GE, GH, GM, GN, GQ, GR, GT, GW, HN, HR, HU, ID, IE, IL, IN, IR, IS, IT, JO, JP, KE, KG, KH, KM, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MC, MD, ME, MG, MK, ML, MN, MR, MT, MW, MX, MY, MZ, NA, NE, NG, NI, NL, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SI, SK, SL, SM, SN, ST, SV, SY, SZ, TD, TG, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, UZ, VC, VN, WS, ZA, ZM, ZW)
  • CLUBE, Francis [GB]/[CH] (US)
  • AMREIN, Andreas [CH]/[CH] (US)
  • LEBUGLE, Maxime [FR]/[CH] (US)
  • SOLAK, Harun [TR]/[CH] (US)
  • WANG, Li [CN]/[CH] (US)
Inventors
  • CLUBE, Francis
  • AMREIN, Andreas
  • LEBUGLE, Maxime
  • SOLAK, Harun
  • WANG, Li
Priority Data
62/824,50827.03.2019US
62/923,74421.10.2019US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) METHOD AND APPARARUS FOR PRINTING A PERIODIC PATTERN WITH A VARYING DUTY CYCLE
(FR) PROCÉDÉ ET APPAREIL D'IMPRESSION D'UN MOTIF PÉRIODIQUE AVEC UN RAPPORT CYCLIQUE VARIABLE
Abstract
(EN)
A method for forming a surface-relief grating with a desired spatial variation of duty cycle in a layer of photoresist, which method comprises providing a first mask (31) bearing a high-resolution grating of linear features (32), arranging said first mask at a first distance from a substrate (33), providing a second mask (28) bearing a variable-transmission grating of opaque and transparent linear features (27) that has a designed spatial variation of duty cycle, arranging said second mask at a distance before the first mask such that the linear features of the variable-transmission grating are orthogonal to the linear features of the high-resolution grating, illuminating the second mask while varying the first distance according to displacement Talbot lithography and also displacing the second mask at an angle to its linear features such that there is substantially no component of modulation with the period of the variable-transmission grating in the energy density distribution that exposes the photoresist.
(FR)
L'invention concerne un procédé de formation d'un réseau en relief de surface comprenant une variation spatiale souhaitée du rapport cyclique dans une couche de résine photosensible, ledit procédé consistant à fournir un premier masque (31) portant un réseau de caractéristiques linéaires (32) à haute résolution, à agencer ledit premier masque à une première distance du substrat (33), à fournir un second masque (28) portant un réseau de transmission variable de caractéristiques linéaires opaques et transparentes (27) qui a une variation spatiale de rapport cyclique conçue, à agencer ledit second masque à une distance avant le premier masque de telle sorte que les caractéristiques linéaires du réseau de transmission variable soient orthogonales aux caractéristiques linéaires du réseau à haute résolution, à éclairer le second masque tout en faisant varier la première distance selon une lithographie de Talbot à déplacement et à déplacer également le second masque selon un angle par rapport à ses caractéristiques linéaires de telle sorte qu'il n'y a sensiblement aucun composant de modulation avec la période du réseau de transmission variable dans la distribution de densité d'énergie qui expose la résine photosensible.
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