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1. WO2020193102 - SYSTEM AND METHOD FOR ALIGNMENT OF SECONDARY BEAMS IN MULTI-BEAM INSPECTION APPARATUS

Publication Number WO/2020/193102
Publication Date 01.10.2020
International Application No. PCT/EP2020/055959
International Filing Date 06.03.2020
IPC
H01J 37/05 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
05Electron- or ion-optical arrangements for separating electrons or ions according to their energy
H01J 37/147 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
147Arrangements for directing or deflecting the discharge along a desired path
H01J 37/28 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
26Electron or ion microscopes; Electron- or ion-diffraction tubes
28with scanning beams
CPC
H01J 2237/1501
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
15Means for deflecting or directing discharge
1501Beam alignment means or procedures
H01J 2237/1508
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
15Means for deflecting or directing discharge
1508Combined electrostatic-electromagnetic means
H01J 37/05
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
05Electron or ion-optical arrangements for separating electrons or ions according to their energy ; or mass
H01J 37/1471
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
147Arrangements for directing or deflecting the discharge along a desired path
1471for centering, aligning or positioning of ray or beam
H01J 37/28
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
26Electron or ion microscopes; Electron or ion diffraction tubes
28with scanning beams
Applicants
  • ASML NETHERLANDS B.V. [NL]/[NL]
Inventors
  • XI, Qingpo
  • HU, Xuerang
  • LIU, Xuedong
  • REN, Weiming
  • CHEN, Zhong-wei
Agents
  • PETERS, John Antoine
Priority Data
62/824,95427.03.2019US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) SYSTEM AND METHOD FOR ALIGNMENT OF SECONDARY BEAMS IN MULTI-BEAM INSPECTION APPARATUS
(FR) SYSTÈME ET PROCÉDÉ D'ALIGNEMENT DE FAISCEAUX SECONDAIRES DANS UN APPAREIL D'INSPECTION À FAISCEAUX MULTIPLES
Abstract
(EN)
A multi-beam inspection apparatus including an adjustable beam separator is disclosed. The adjustable beam separator is configured to change a path of a secondary particle beam. The adjustable beam separator comprises a first Wien filter and a second Wien filter. Both Wien filters are aligned with a primary optical axis. The first Wien filter and the second Wien filter are independently controllable via a first excitation input and a second excitation input, respectively. The adjustable beam separator is configured move the effective bending point of the adjustable beam separator along the primary optical axis based on the first excitation input and the second excitation input.
(FR)
L'invention concerne un appareil d'inspection à faisceaux multiples comprenant un séparateur de faisceau réglable. Le séparateur de faisceau réglable est conçu pour modifier un trajet d'un faisceau de particules secondaire. Le séparateur de faisceau réglable comprend un premier filtre de Wien et un second filtre de Wien. Les deux filtres de Wien sont alignés sur un axe optique primaire. Le premier filtre de Wien et le second filtre de Wien peuvent être commandés indépendamment par l'intermédiaire d'une première entrée d'excitation et d'une seconde entrée d'excitation, respectivement. Le séparateur de faisceau réglable est conçu pour déplacer le point de courbure efficace du séparateur de faisceau réglable le long de l'axe optique primaire sur la base de la première entrée d'excitation et de la seconde entrée d'excitation.
Latest bibliographic data on file with the International Bureau