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1. WO2020193075 - FREQUENCY BROADENING APPARATUS AND METHOD

Publication Number WO/2020/193075
Publication Date 01.10.2020
International Application No. PCT/EP2020/055288
International Filing Date 28.02.2020
IPC
G02F 1/355 2006.01
GPHYSICS
02OPTICS
FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
35Non-linear optics
355characterised by the materials used
CPC
G02B 6/02328
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
6Light guides
02Optical fibre with cladding ; with or without a coating
02295Microstructured optical fibre
02314Plurality of longitudinal structures extending along optical fibre axis, e.g. holes
02319characterised by core or core-cladding interface features
02323Core having lower refractive index than cladding, e.g. photonic band gap guiding
02328Hollow or gas filled core
G03F 7/70133
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70058Mask illumination systems
70133Measurement of illumination distribution, in pupil plane or field plane
G03F 7/7015
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70058Mask illumination systems
7015Details of optical elements
G03F 7/70316
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70216Systems for imaging mask onto workpiece
70316Details of optical elements, e.g. of Bragg reflectors or diffractive optical elements
G03F 7/70325
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70216Systems for imaging mask onto workpiece
70325Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lens
Applicants
  • ASML NETHERLANDS B.V. [NL]/[NL]
Inventors
  • UEBEL, Patrick, Sebastian
  • BAUERSCHMIDT, Sebastian, Thomas
  • SCHOLTES - VAN EIJK, Paul, William
Agents
  • WILLEKENS, Jeroen Pieter Frank
Priority Data
19164997.925.03.2019EP
19207621.407.11.2019EP
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) FREQUENCY BROADENING APPARATUS AND METHOD
(FR) APPAREIL ET PROCÉDÉ D'ÉLARGISSEMENT DE FRÉQUENCES
Abstract
(EN)
An apparatus (100) for receiving input radiation (108) and broadening a frequency range of the input radiation so as to provide broadband output radiation (110). The apparatus comprises a fiber (102), wherein the fiber (102) may comprise a hollow core (104) for guiding radiation propagating through the fiber (102). The apparatus (100) further comprises an apparatus for providing a gas mixture (106) within the hollow core (104). The gas mixture (106) comprises a hydrogen component, and a working component, wherein the working component is for broadening a frequency range of a received input radiation (108) so as to provide the broadband output radiation (110). The apparatus may be included in a radiation source.
(FR)
L'invention concerne un appareil (100) pour recevoir un rayonnement d'entrée (108) et élargir une plage de fréquences du rayonnement d'entrée de façon à fournir un rayonnement de sortie à large bande (110). L'appareil comprend une fibre (102), la fibre (102) pouvant comprendre un noyau creux (104) pour guider un rayonnement se propageant à travers la fibre (102). L'appareil (100) comprend en outre un appareil pour fournir un mélange gazeux (106) à l'intérieur du noyau creux (104). Le mélange gazeux (106) comprend un composant d'hydrogène, et un composant de travail, le composant de travail étant destiné à élargir une plage de fréquences d'un rayonnement d'entrée reçu (108) de façon à fournir le rayonnement de sortie à large bande (110). L'appareil peut être compris dans une source de rayonnement.
Also published as
Latest bibliographic data on file with the International Bureau