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1. WO2020192420 - MASK AND MANUFACTURING METHOD THEREFOR, AND MASK ASSEMBLY

Publication Number WO/2020/192420
Publication Date 01.10.2020
International Application No. PCT/CN2020/078723
International Filing Date 11.03.2020
IPC
C23C 14/04 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
04Coating on selected surface areas, e.g. using masks
C23C 14/24 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
24Vacuum evaporation
Applicants
  • 京东方科技集团股份有限公司 BOE TECHNOLOGY GROUP CO., LTD. [CN]/[CN]
  • 成都京东方光电科技有限公司 CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. [CN]/[CN]
Inventors
  • 郑勇 ZHENG, Yong
  • 杜帅 DU, Shuai
  • 丁文彪 DING, Wenbiao
Agents
  • 北京中博世达专利商标代理有限公司 BEIJING ZBSD PATENT&TRADEMARK AGENT LTD.
Priority Data
201910244878.228.03.2019CN
Publication Language Chinese (ZH)
Filing Language Chinese (ZH)
Designated States
Title
(EN) MASK AND MANUFACTURING METHOD THEREFOR, AND MASK ASSEMBLY
(FR) MASQUE ET SON PROCÉDÉ DE FABRICATION, ET ENSEMBLE MASQUE
(ZH) 掩膜版及其制作方法、掩膜版组件
Abstract
(EN)
Disclosed is a mask (10, 10,), comprising a mask pattern area (01), and a non-mask pattern area (02) located at the periphery of the mask pattern area (01). The mask pattern area (01) comprises at least one active mask area (100); in any active mask area (100), the mask (10) comprises: a plurality of evaporation holes (101), and a baffle strip (102) located between every two adjacent evaporation holes (101); the mask (10) is provided with a soldering area (21) in the non-mask pattern area (02); the thickness of a portion, in the non-mask pattern area (02) and at least in the soldering area (21), of the mask (10) is greater than the thickness of the baffle strip (102), in the active mask area (100), of the mask (10); and the thickness refers to the dimension of a corresponding part in the direction perpendicular to the plane where the mask (10) is located. Further disclosed are a mask assembly (A,), and a manufacturing method for the mask (10, 10,).
(FR)
L'invention concerne un masque (10, 10,), comprenant une zone de motif de masque (01) et une zone de motif sans masque (02) située à la périphérie de la zone de motif de masque (01). La zone de motif de masque (01) comprend au moins une zone de masque active (100) ; dans n'importe quelle zone de masque active (100), le masque (10) comporte : une pluralité de trous d'évaporation (101), et une bande déflectrice (102) située entre chaque paire de trous d'évaporation adjacents (101) ; le masque (10) est pourvu d'une zone de brasage (21) dans la zone de motif sans masque (02) ; l'épaisseur d'une partie, dans la zone de motif sans masque (02) et au moins dans la zone de brasage (21), du masque (10) est supérieure à l'épaisseur de la bande déflectrice (102), dans la zone de masque active (100), du masque (10) ; et l'épaisseur renvoie à la dimension d'une partie correspondante dans la direction perpendiculaire au plan où se trouve le masque (10). L'invention concerne en outre un ensemble masque (A,) et un procédé de fabrication du masque (10, 10,).
(ZH)
一种掩膜版(10,10 ),具有掩膜图案区(01)以及位于掩膜图案区(01)周侧的非掩膜图案区(02);掩膜图案区(01)包括至少一个有效掩膜区(100);在任一有效掩膜区(100)内,掩膜版(10)包括:多个蒸镀孔(101);以及,位于相邻的两个蒸镀孔(101)之间的遮挡条(102);掩膜版(10)在非掩膜图案区(02)内设置有焊接区(21);掩膜版(10)在非掩膜图案区(02)内的部分,至少在焊接区(21)的厚度,大于掩膜版(10)在有效掩膜区(100)的遮挡条(102)的厚度;厚度是指对应部位沿垂直于掩膜版(10)所在平面的方向的尺寸。还公开了一种掩膜版组件(A )及一种掩膜版(10,10 )的制作方法。
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