Processing

Please wait...

PATENTSCOPE will be unavailable a few hours for maintenance reason on Saturday 31.10.2020 at 7:00 AM CET
Settings

Settings

Goto Application

1. WO2020191821 - QUANTUM DOT MATERIAL PROCESSING METHOD, HIGHLY STABLE QUANTUM DOT MATERIAL AND APPLICATION THEREOF

Publication Number WO/2020/191821
Publication Date 01.10.2020
International Application No. PCT/CN2019/082410
International Filing Date 12.04.2019
IPC
C09K 11/02 2006.01
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
KMATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
11Luminescent, e.g. electroluminescent, chemiluminescent, materials
02Use of particular materials as binders, particle coatings or suspension media therefor
B82Y 20/00 2011.01
BPERFORMING OPERATIONS; TRANSPORTING
82NANOTECHNOLOGY
YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE  OR TREATMENT OF NANOSTRUCTURES
20Nanooptics, e.g. quantum optics or photonic crystals
B82Y 30/00 2011.01
BPERFORMING OPERATIONS; TRANSPORTING
82NANOTECHNOLOGY
YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE  OR TREATMENT OF NANOSTRUCTURES
30Nanotechnology for materials or surface science, e.g. nanocomposites
H01L 33/00 2010.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
33Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
Applicants
  • 天津市中环量子科技有限公司 TIANJIN ZHONGHUAN QUANTUM TECH CO., LTD. [CN]/[CN]
Inventors
  • 卢睿 LU, Rui
  • 边盾 BIAN, Dun
  • 马昊玥 MA, Haoyue
  • 杨磊 YANG, Lei
  • 刘莹 LIU, Ying
Agents
  • 广州嘉权专利商标事务所有限公司 JIAQUAN IP LAW FIRM
Priority Data
201910236499.927.03.2019CN
Publication Language Chinese (ZH)
Filing Language Chinese (ZH)
Designated States
Title
(EN) QUANTUM DOT MATERIAL PROCESSING METHOD, HIGHLY STABLE QUANTUM DOT MATERIAL AND APPLICATION THEREOF
(FR) PROCÉDÉ DE TRAITEMENT DE MATÉRIAU À POINTS QUANTIQUES, MATÉRIAU À POINTS QUANTIQUES HAUTEMENT STABLE ET APPLICATION DE CELUI-CI
(ZH) 一种量子点材料的处理方法、高稳定量子点材料和应用
Abstract
(EN)
A quantum dot material processing method, a highly stable quantum dot material and an application thereof; the surface of the quantum dot material contains the element sulfur, and the quantum dot material processing method comprises the following steps: (1) dispersing a metal salt in a solvent under an inert atmosphere to obtain a metal salt stock solution; (2) taking or preparing a dispersion liquid of a quantum dot material, and adding same to the metal salt stock solution for reaction under an inert atmosphere. For quantum dots the surfaces of which contain the element sulfur, a metal sulfide cation having strong binding force is introduced by means of a reaction between metal salt and the element sulfur on the surface of the quantum dots, thereby terminating the reaction activity by which the quantum dots may be continuously grown, and improving the chemical stability of the quantum dots. The present invention has a high quantum dot fluorescence yield, and has good application prospects in the field of lighting and display.
(FR)
L'invention concerne un procédé de traitement de matériau à points quantiques, un matériau à points quantiques hautement stables et une application de celui-ci. La surface du matériau à points quantiques contient l'élément soufre, et le procédé de traitement de matériau à points quantiques comprend les étapes suivantes : (1) dispersion d'un sel métallique dans un solvant sous une atmosphère inerte pour obtenir une solution mère de sel métallique ; (2) prise ou préparation d'un liquide de dispersion d'un matériau à points quantiques, et ajout de celui-ci à la solution mère de sel métallique pour une réaction sous atmosphère inerte. Pour des points quantiques dont les surfaces contiennent l'élément soufre, un cation de sulfure métallique ayant une force de liaison forte est introduit au moyen d'une réaction entre le sel métallique et l'élément soufre sur la surface des points quantiques, ce qui permet de terminer l'activité de réaction par laquelle les points quantiques peuvent croître en continu, et d'améliorer la stabilité chimique des points quantiques. La présente invention présente un rendement de fluorescence de points quantiques élevé, et offre de bonnes perspectives d'application dans le domaine de l'éclairage et de l'affichage.
(ZH)
一种量子点材料的处理方法、高稳定量子点材料和应用,所述量子点材料的表面含有硫元素,所述量子点材料的处理方法包括以下步骤:(1)取金属盐在惰性气氛下分散于溶剂中,得到金属盐储备液;(2)取或制备量子点材料的分散液,在惰性气氛下加入所述金属盐储备液进行反应。针对表面含有硫元素的量子点,通过金属盐与量子点表面的硫元素反应,引入一种强结合力的金属硫化物阳离子,终止量子点可继续生长的反应活性,提高了量子点的化学稳定性,具有较高的量子点荧光产率,在照明和显示领域具有较好的应用前景。
Also published as
Latest bibliographic data on file with the International Bureau