Processing

Please wait...

PATENTSCOPE will be unavailable a few hours for maintenance reason on Saturday 31.10.2020 at 7:00 AM CET
Settings

Settings

Goto Application

1. WO2020191690 - PHOTO-CURABLE COMPOSITIONS FOR ADDITIVE MANUFACTURING

Publication Number WO/2020/191690
Publication Date 01.10.2020
International Application No. PCT/CN2019/080001
International Filing Date 28.03.2019
IPC
C08G 59/18 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
59Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by reaction of epoxy polycondensates with monofunctional low-molecular-weight compounds; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
B33Y 70/00 2015.01
BPERFORMING OPERATIONS; TRANSPORTING
33ADDITIVE MANUFACTURING TECHNOLOGY
YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
70Materials specially adapted for additive manufacturing
Applicants
  • HENKEL AG & CO. KGAA [DE]/[DE]
  • HENKEL (CHINA) CO., LTD. [CN]/[CN] (SC)
Inventors
  • CHEN, Chunfu
  • LU, Daoqiang
Agents
  • NTD PATENT AND TRADEMARK AGENCY LIMITED
Priority Data
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) PHOTO-CURABLE COMPOSITIONS FOR ADDITIVE MANUFACTURING
(FR) COMPENSATIONS PHOTODURCISSABLES POUR LA FABRICATION D'ADDITIF
Abstract
(EN)
A photo-curable composition for use in additive manufacturing is presented. Said composition comprising: a) at least one epoxidized polyolefin which is characterized by a residual olefinic unsaturation of from 0.01 to 0.5 meq/g polymer and which is selected from the group consisting of epoxidized alicyclic polyolefin and epoxidized aliphatic polyolefin; optionally b) at least one epoxide compound which is distinct from the epoxidized polyolefin (a); c) at least one compound which has at least two reactive mercapto-groups per molecule; d) at least one free radical photoinitiator compound; and, e) at least one polyamine having at least two amine hydrogens reactive toward epoxide groups.
(FR)
L'invention concerne une composition photodurcissable destinée à être utilisée dans la fabrication d'additif. Ladite composition comprenant : a) au moins une polyoléfine époxydée qui est caractérisée par une insaturation oléfinique résiduelle de 0,01 à 0,5 méq/g de polymère et qui est choisie dans le groupe constitué par une polyoléfine alicyclique époxydée et une polyoléfine aliphatique époxydée ; éventuellement b) au moins un composé époxyde qui est différent de la polyoléfine époxydée (a) ; c) au moins un composé qui possède au moins deux groupes mercapto réactifs par molécule ; d) au moins un composé photoinitiateur de radicaux libres ; et, e) au moins une polyamine ayant au moins deux hydrogènes aminés réactifs vis-à-vis des groupes époxyde.
Latest bibliographic data on file with the International Bureau