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1. WO2020142302 - BORON-BASED CAPPING LAYERS FOR EUV OPTICS

Publication Number WO/2020/142302
Publication Date 09.07.2020
International Application No. PCT/US2019/068220
International Filing Date 23.12.2019
IPC
G02B 1/04 2006.1
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
1Optical elements characterised by the material of which they are made; Optical coatings for optical elements
04made of organic materials, e.g. plastics
CPC
G01N 21/9501
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
84Systems specially adapted for particular applications
88Investigating the presence of flaws or contamination
95characterised by the material or shape of the object to be examined
9501Semiconductor wafers
G02B 27/0006
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
27Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
0006with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
G02B 5/0833
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
08Mirrors
0816Multilayer mirrors, i.e. having two or more reflecting layers
0825the reflecting layers comprising dielectric materials only
0833comprising inorganic materials only
G02B 5/0891
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
08Mirrors
0891Ultraviolet [UV] mirrors
G03F 7/16
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
16Coating processes; Apparatus therefor
G21K 1/062
GPHYSICS
21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
1Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
06using diffraction, refraction or reflection, e.g. monochromators
062Devices having a multilayer structure
Applicants
  • KLA CORPORATION [US]/[US]
Inventors
  • DELGADO, Gildardo
  • HILL, Shannon B.
  • MARKS, Zefram
Agents
  • MCANDREWS, Kevin
  • MORRIS, Elizabeth M.N.
Priority Data
16/413,74016.05.2019US
62/788,33004.01.2019US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) BORON-BASED CAPPING LAYERS FOR EUV OPTICS
(FR) COUCHES DE RECOUVREMENT À BASE DE BORE POUR OPTIQUE EUV
Abstract
(EN)
Disclosed herein are optical elements and methods for making the same. Such optical elements may comprise a first layer disposed on a substrate, a second layer disposed on the first layer, a terminal layer disposed on the second layer, and a cap layer disposed on the terminal layer. The cap layer may comprise boron, boron nitride, or boron carbide. Such optical elements may be made using a method comprising depositing a first layer using vapor deposition such that the first layer is disposed on a substrate, depositing a second layer using vapor deposition such that the second layer is disposed on the first layer, depositing a terminal layer using vapor deposition such that the terminal layer is disposed on the second layer, and depositing a cap layer comprising boron, boron nitride, or boron carbide using vapor deposition such that the cap layer is disposed on the terminal layer.
(FR)
La présente invention concerne des éléments optiques et leurs procédés de fabrication. De tels éléments optiques peuvent comprendre une première couche disposée sur un substrat, une seconde couche disposée sur la première couche, une couche de borne disposée sur la seconde couche, et une couche de recouvrement disposée sur la couche de borne. La couche de recouvrement peut comprendre du bore, du nitrure de bore ou du carbure de bore. De tels éléments optiques peuvent être fabriqués à l'aide d'un procédé comprenant le dépôt d'une première couche à l'aide d'un dépôt en phase vapeur de telle sorte que la première couche est disposée sur un substrat, le dépôt d'une seconde couche à l'aide d'un dépôt en phase vapeur de telle sorte que la seconde couche est disposée sur la première couche, le dépôt d'une couche de borne à l'aide d'un dépôt en phase vapeur de telle sorte que la couche de borne est disposée sur la seconde couche, et le dépôt d'une couche de recouvrement comprenant du bore, du nitrure de bore ou du carbure de bore à l'aide d'un dépôt en phase vapeur de telle sorte que la couche de recouvrement est disposée sur la couche de borne.
Also published as
Latest bibliographic data on file with the International Bureau