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1. WO2020141031 - MULTI-BEAM INSPECTION APPARATUS

Publication Number WO/2020/141031
Publication Date 09.07.2020
International Application No. PCT/EP2019/082625
International Filing Date 26.11.2019
IPC
H01J 37/147 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
147Arrangements for directing or deflecting the discharge along a desired path
CPC
H01J 2237/0453
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
04Means for controlling the discharge
045Diaphragms
0451with fixed aperture
0453multiple apertures
H01J 2237/1516
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
15Means for deflecting or directing discharge
151Electrostatic means
1516Multipoles
H01J 2237/153
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
153Correcting image defects, e.g. stigmators
H01J 2237/24592
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
245Detection characterised by the variable being measured
24592Inspection and quality control of devices
H01J 37/1471
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
147Arrangements for directing or deflecting the discharge along a desired path
1471for centering, aligning or positioning of ray or beam
H01J 37/1477
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
147Arrangements for directing or deflecting the discharge along a desired path
1472Deflecting along given lines
1474Scanning means
1477electrostatic
Applicants
  • ASML NETHERLANDS B.V. [NL]/[NL]
Inventors
  • REN, Weiming
  • ZHANG, Qian
  • HU, Xuerang
  • LIU, Xuedong
Agents
  • PETERS, John Antoine
Priority Data
62/787,15731.12.2018US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) MULTI-BEAM INSPECTION APPARATUS
(FR) APPAREIL D'INSPECTION À FAISCEAUX MULTIPLES
Abstract
(EN)
A micro-structure deflector array (622) is disclosed. The micro-structure deflector array includes a plurality of multipole structures (622-1 to 622-47). The micro-deflector deflector array comprises a first multipole structure (622-26,..., 622-47) having a first radial shift from a central axis of the array and a second multipole structure (622-1) having a second radial shift from the central axis of the array. The first radial shift is larger than the second radial shift, and the first multipole structure comprises a greater number of pole electrodes than the second multipole structure to reduce deflection aberrations when the plurality of multipole structures deflects a plurality of charged particle beams. The micro-structure deflector array may be included in an improved source conversion unit of a multi-beam inspection apparatus.
(FR)
L'invention concerne un réseau de déflecteurs de micro-structure 622. Le réseau de déflecteurs de micro-structure comprend une pluralité de structures multipolaires 622-1 à 622-47. Le réseau de déflecteur de micro-déflecteur comprend une première structure multipolaire 622-26.., 622-47 ayant un premier décalage radial à partir d'un axe central du réseau et une seconde structure multipolaire 622-1 ayant un second décalage radial à partir de l'axe central du réseau. Le premier décalage radial est supérieur au second décalage radial, et la première structure multipolaire comprend un nombre supérieur d'électrodes polaires que la seconde structure multipolaire pour réduire les aberrations de déflexion lorsque la pluralité de structures multipolaires dévie une pluralité de faisceaux de particules chargées. Le réseau de déflecteurs de micro-structure peut être inclus dans une unité de conversion de source améliorée d'un appareil d'inspection à faisceaux multiples.
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