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1. WO2020140718 - MASK MANUFACTURING METHOD AND MASK

Publication Number WO/2020/140718
Publication Date 09.07.2020
International Application No. PCT/CN2019/124788
International Filing Date 12.12.2019
IPC
G03F 1/36 2012.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
36Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction design processes
CPC
G03F 1/36
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
1Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
36Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
Applicants
  • 无锡华润上华科技有限公司 CSMC TECHNOLOGIES FAB2 CO., LTD. [CN]/[CN]
Inventors
  • 陈洁 CHEN, Jie
  • 王谨恒 WANG, Jinheng
  • 朱斌 ZHU, Bin
  • 张斌 ZHANG, Bin
  • 张剑 ZHANG, Jian
Agents
  • 广州华进联合专利商标代理有限公司 ADVANCE CHINA IP LAW OFFICE
Priority Data
201910003405.303.01.2019CN
Publication Language Chinese (ZH)
Filing Language Chinese (ZH)
Designated States
Title
(EN) MASK MANUFACTURING METHOD AND MASK
(FR) PROCÉDÉ DE FABRICATION DE MASQUE ET MASQUE
(ZH) 掩模版制作方法和掩模版
Abstract
(EN)
A mask manufacturing method, comprising: establishing an OPC procedure; providing a design pattern, and pretreating a corner pattern in the design pattern; performing OPC operation on the design pattern comprising the pretreated corner pattern according to the OPC procedure; and manufacturing a mask according to the pattern subjected to the OPC operation. Therefore, it can be ensured that not only an intermediate CD, but also a corner CD can meet the actual requirements, thereby effectively avoiding the problem that the corner is excessively rounded resulting from meeting the intermediate CD by sacrificing the corner CD such that the user requirements cannot be met.
(FR)
La présente invention concerne un procédé de fabrication de masque comprenant les étapes consistant à : établir une procédure OPC ; fournir un motif de conception et prétraiter un motif de coin dans le motif de conception ; effectuer une opération OPC sur le motif de conception comprenant le motif de coin prétraité selon la procédure OPC ; et à fabriquer un masque selon le motif soumis à l'opération OPC. Par conséquent, il est possible d'assurer que non seulement un CD intermédiaire, mais également un CD en coin, peuvent satisfaire aux exigences réelles, ce qui permet d'éviter efficacement le problème selon lequel le coin est excessivement arrondi en raison de la rencontre du CD intermédiaire par le sacrifice du CD en coin de telle sorte que les exigences de l'utilisateur ne peuvent pas être satisfaites.
(ZH)
一种掩模版制作方法,包括:建立OPC程序;提供设计图形,对设计图形中的转角图形进行预处理;根据OPC程序,对包含预处理后的转角图形的设计图形进行OPC运算;按照OPC运算后的图形制作掩模版,从而不仅可以保证中间CD满足实际需求,而且可以保证转角CD满足实际需求,有效避免了通过牺牲转角CD来满足中间CD导致的转角过于圆弧化而无法满足用户需求的问题。
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