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1. WO2020140234 - TEMPLATE PREPARATION METHOD

Publication Number WO/2020/140234
Publication Date 09.07.2020
International Application No. PCT/CN2019/070246
International Filing Date 03.01.2019
IPC
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
H01L 21/316 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
04the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18the devices having semiconductor bodies comprising elements of group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20-H01L21/26142
31to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After-treatment of these layers; Selection of materials for these layers
314Inorganic layers
316composed of oxides or glassy oxides or oxide-based glass
Applicants
  • 京东方科技集团股份有限公司 BOE TECHNOLOGY GROUP CO., LTD. [CN]/[CN]
Inventors
  • 郭康 GUO, Kang
  • 王路 WANG, Lu
Agents
  • 北京市柳沈律师事务所 LIU, SHEN & ASSOCIATES
Priority Data
Publication Language Chinese (ZH)
Filing Language Chinese (ZH)
Designated States
Title
(EN) TEMPLATE PREPARATION METHOD
(FR) PROCÉDÉ DE PRÉPARATION DE MODÈLE
(ZH) 模板制备方法
Abstract
(EN)
A template preparation method, comprising: providing a substrate (100); forming a photoresist pattern (200) on the substrate (100); and patterning the substrate (100) by using the photoresist pattern (200) as a mask. In addition, said forming a photoresist pattern (200) comprising: forming, on the substrate (100), a plurality of first patterns (210) arranged at intervals; forming a first material layer (300) on the plurality of first patterns (210); patterning at least one first pattern (210) by using the first material layer (300) as a mask, so as to enable the first pattern (210) to form at least one first sub-pattern (211); and removing the first material layer (300), the first material layer (300) at least covering, in a direction perpendicular to a plane where the substrate (100) is located, one side of the at least one first pattern (210). The method above can improve the fineness of a template.
(FR)
La présente invention concerne un procédé de préparation de modèle comprenant : la fourniture d'un substrat (100) ; la formation d'un motif de résine photosensible (200) sur le substrat (100) ; et la formation d'un motif sur le substrat (100) en utilisant le motif de résine photosensible (200) en tant que masque. De plus, ladite formation d'un motif de résine photosensible (200) comprend : la formation, sur le substrat (100), d'une pluralité de premiers motifs (210) disposés à intervalles ; la formation d'une première couche de matériau (300) sur la pluralité de premiers motifs (210) ; la formation d'au moins un premier motif (210) en utilisant la première couche de matériau (300) en tant que masque de manière à permettre au premier motif (210) de former au moins un premier sous-motif (211) ; et l'élimination de la première couche de matériau (300), la première couche de matériau (300) recouvrant au moins un côté du ou des premiers motifs (210) dans une direction perpendiculaire à un plan dans lequel le substrat (100) est situé. Le procédé ci-dessus permet d'améliorer la finesse d'un modèle.
(ZH)
一种模板制备方法,包括:提供基底(100);在基底(100)上形成光刻胶图案(200);以光刻胶图案(200)为掩模构图基底(100),且形成光刻胶图案(200)包括:在基底(100)上形成间隔排布的多个第一图案(210);在多个第一图案(210)上形成第一材料层(300);利用第一材料层(300)为掩模构图至少一个第一图案(210),使得第一图案(210)形成为至少一个第一子图案(211);以及去除第一材料层(300);其中,在垂直于基底(100)所在面的方向上,第一材料层(300)至少覆盖至少一个第一图案(210)的一侧。上述方法可以提高模板的精细度。
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