Processing

Please wait...

Settings

Settings

Goto Application

1. WO2020138198 - POLISHING PAD

Publication Number WO/2020/138198
Publication Date 02.07.2020
International Application No. PCT/JP2019/050894
International Filing Date 25.12.2019
IPC
B24B 37/24 2012.01
BPERFORMING OPERATIONS; TRANSPORTING
24GRINDING; POLISHING
BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
37Lapping machines or devices; Accessories
11Lapping tools
20Lapping pads for working plane surfaces
24characterised by the composition or properties of the pad materials
C08G 18/32 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
18Polymeric products of isocyanates or isothiocyanates
06with compounds having active hydrogen
28characterised by the compounds used containing active hydrogen
30Low-molecular-weight compounds
32Polyhydroxy compounds; Polyamines; Hydroxy amines
C08G 18/40 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
18Polymeric products of isocyanates or isothiocyanates
06with compounds having active hydrogen
28characterised by the compounds used containing active hydrogen
40High-molecular-weight compounds
C08G 18/75 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
18Polymeric products of isocyanates or isothiocyanates
06with compounds having active hydrogen
70characterised by the isocyanates or isothiocyanates used
72Polyisocyanates or polyisothiocyanates
74cyclic
75cycloaliphatic
C08G 18/76 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
18Polymeric products of isocyanates or isothiocyanates
06with compounds having active hydrogen
70characterised by the isocyanates or isothiocyanates used
72Polyisocyanates or polyisothiocyanates
74cyclic
76aromatic
C08J 5/06 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H142
5Manufacture of articles or shaped materials containing macromolecular substances
04Reinforcing macromolecular compounds with loose or coherent fibrous material
06using pretreated fibrous materials
CPC
B24B 37/24
BPERFORMING OPERATIONS; TRANSPORTING
24GRINDING; POLISHING
BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
37Lapping machines or devices; Accessories
11Lapping tools
20Lapping pads for working plane surfaces
24characterised by the composition or properties of the pad materials
C08G 18/32
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
18Polymeric products of isocyanates or isothiocyanates
06with compounds having active hydrogen
28characterised by the compounds used containing active hydrogen
30Low-molecular-weight compounds
32Polyhydroxy compounds; Polyamines; Hydroxyamines
C08G 18/40
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
18Polymeric products of isocyanates or isothiocyanates
06with compounds having active hydrogen
28characterised by the compounds used containing active hydrogen
40High-molecular-weight compounds
C08G 18/75
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
18Polymeric products of isocyanates or isothiocyanates
06with compounds having active hydrogen
70characterised by the isocyanates or isothiocyanates used
72Polyisocyanates or polyisothiocyanates
74cyclic
75cycloaliphatic
C08G 18/76
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
18Polymeric products of isocyanates or isothiocyanates
06with compounds having active hydrogen
70characterised by the isocyanates or isothiocyanates used
72Polyisocyanates or polyisothiocyanates
74cyclic
76aromatic
C08J 5/06
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G
5Manufacture of articles or shaped materials containing macromolecular substances
04Reinforcing macromolecular compounds with loose or coherent fibrous material
06using pretreated fibrous materials
Applicants
  • 株式会社クラレ KURARAY CO., LTD. [JP]/[JP]
Inventors
  • 服部 和正 HATTORI Kazumasa
  • 加藤 晋哉 KATO Shinya
  • 岡本 知大 OKAMOTO Chihiro
  • 高岡 信夫 TAKAOKA Nobuo
  • 林 浩一 HAYASHI Koichi
Agents
  • 特許業務法人大谷特許事務所 OHTANI PATENT OFFICE
Priority Data
2018-24407527.12.2018JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) POLISHING PAD
(FR) TAMPON À POLIR
(JA) 研磨パッド
Abstract
(EN)
Provided is a non-woven-fabric polishing pad characterized in having polishing performance that is exceptional in terms of polishing stability and smoothness of a polished object, and moreover characterized in that the change in the polishing performance is low even if polishing continues for an extended period of time, the polishing pad having a high polishing rate. This polishing pad is characterized in that a non-woven fabric is impregnated with a non-porous polymer elastic body and a porous polymer elastic body, the porous polymer elastic body includes thermoplastic polyurethane, and the ratio of the mass of the non-porous polymer elastic body to the mass of the porous polymer elastic body is 0.49 or less.
(FR)
L'invention fournit un tampon à polir de taux de polissage élevé et de type tissu non-tissé qui est caractéristique en ce qu'il présente des performances de polissage excellentes en termes de stabilité de polissage et de régularité d'un objet à polir. Plus précisément, l'invention concerne un tampon à polir dans lequel un corps élastique de polymère non poreux et un corps élastique de polymère poreux imprègnent un tissu non-tissé. Ce tampon à polir est caractéristique en ce que ledit corps élastique de polymère poreux contient un polyuréthane thermoplastique, et le rapport de la masse dudit corps élastique de polymère non poreux vis-à-vis de la masse dudit corps élastique de polymère non poreux est inférieur ou égal à 0,49.
(JA)
研磨安定性及び研磨対象物の平滑性に優れた研磨性能を有し、長時間研磨を続けても研磨性能の変化が小さい特徴を有する不織布タイプの研磨パッドにおいて、研磨レートの高い研磨パッドを提供する。 不織布に無孔質高分子弾性体と多孔質高分子弾性体とを含浸させた研磨パッドであり、前記多孔質高分子弾性体は熱可塑性ポリウレタンを含み、前記多孔質高分子弾性体の質量に対する前記無孔質高分子弾性体の質量の比が0.49以下であることを特徴とする、研磨パッド。
Also published as
JP2020563359
Latest bibliographic data on file with the International Bureau